Used NOVELLUS CONCEPT 2 Speed #9105955 for sale
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ID: 9105955
Wafer Size: 8"
System, 8"
System Controller: MC3
Signal Tower: None
AC power rack: Standard
Interconnect cables: Not Available
DLCM
Transfer Robot Type: Brooks MTR 5
Paddle Type: Standard
Shuttle Type: Standard
Cassette Type: Unknown
Indexer Type: Type II
Animatics Type: MEI missing
Cool Station: Missing
SMIF loader type: None
Manometer: Missing
Second manometer in frame: 10 Torr
Facilities Configuration: Either
Control System: QNX4 unknown IOC
Pedestal Lift: Yes, Standard
Turbo Pumps: Missing
Ceramic Dome: Yes, type unknown
Gas Nozzles: Yes, type unknown
ESC: Missing
Temperature Control: Missing
RF Generators
HF RF Generator: NONE
LF Generator: NONE
HF, Cable Length: Missing
LF, Cable Length: Missing
Gas Box Chamber A
Gas Channels: 6
Valves: 6
1 Ar 1000 sccm AERA 7800 CD
2 O2 500 sccm AERA 7800 CD
3 NF3 Manifold E AERA 7800 CD
4 SiH4 500 sccm Unit 1661
5 He 500 sccm AERA 7800 CD
6 Missing
7 H2 500 sccm AERA 7800 CD
8 H2 2000 sccm AERA 7800 CD.
NOVELLUS CONCEPT 2 Speed reactor is an advanced semiconductor fabrication equipment used in the production of Integrated Circuits (ICs). The system is designed to produce high-performance devices that are both cost effective and meet the highest standards of quality. The unit incorporates a unique combination of advanced etching, deposition, and surface treatment technologies. The machine is well suited to the production of a wide range of ICs including digital, analog, RF, opto-electronic, MEMS, and Power circuits. At the heart of the tool is a Quantum Resonant Chamber (QRC). This is an advanced, ultra-high vacuum, high-resolution etching asset capable of precise and reproducible patterning within a wide range of materials and on a variety of different substrates. The QRC is capable of producing the most difficult geometries with feature sizes as small as 10 nm. It is also capable of producing submicron lateral and vertical patterns with flatness and line edge raggedness (LER) values that are unmatched in the industry. The QRC is complemented by CONCEPT 2 Speed Deposition Module (NDM). This technology platform is purpose-built for high deposition rates and superior film uniformity. The model is capable of depositing a wide variety of materials, including polysilicon, metal, oxides, nitrides, and insulators. It also can deliver a wide variety of specialty films and enable the fabrication of advanced 3D-structures. In addition, the NDM is engineered to maximize throughput and minimize wafer cycle time. To achieve this, the NDM is capable of simultaneous loading and unloading of up to 300 wafers in four different chambers. It is also able to perform multiple workflows in parallel and can be interfaced with multiple process control systems. NOVELLUS CONCEPT 2 Speed was designed to meet the most stringent contaminant-free requirements, including particle contamination requirements down to 0.15 microns. The equipment is capable of producing number of specialty imaging and etching processes, such as lift-off, recess, SiN opal, and deep etch. The system also offers specialized FIB- and e-beam processes. Overall, CONCEPT 2 Speed Reactor is an advanced, high-performance, cost-effective fabrication unit that offers the unsurpassed flexibility and accuracy required for producing leading-edge ICs.
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