Used NOVELLUS CONCEPT 2 Speed #9140633 for sale

Name: NOVELLUS CONCEPT 2 Speed
Brand: NOVELLUS
SKU: 9140633
Availability: InStock

URL successfully copied!

Reactors

Manufacturer

NOVELLUS

Model

CONCEPT 2 Speed

ID: 9140633

Wafer Size: 8"

Vintage: 2000

Systems, 8" (3) Chambers Wafer shape: flat PET Module Module A: Shrink Process A: STI / IMD Module C: Shrink Process C: STI / IMD System UPS power Module B: Shrink Process B: STI / IMD Loadlock dry pump: LOT 105 Slit valve insert Slit valve type: SMC L-Motion TM dry pump model: LOT 105 Loadlock baratron: MKS TM Turbo pump: PFEIFFER TMH260 TM Throttle valve: MKS TM Baratron model: MKS Wafer sensor Fab installation EMO's (Turn to release) Front monitor: Stand alone UI rack Signal tower Module controller: MC1 Host interface: SECS Module A: Chamber type: Shrink Chamber process: STI / IMD Process clean type: In-situ Module controller: MC1 Module turbo pump: MAG2000 Manometer 1(10T): MKS7 750B Throttle valve: MKS 153D-15973 ESC / Dome cooling: PCW Temperature monitoring: NTM500C Manometer 2(10T): MKS 750B HF Generator: AE RFG5500 LF Generator: AE PDX 8000 RF Match: Mercury 3013 Manometer 3(100m): MKS 629B Dual clean injector kit Injector type: Single Louvered screen Pedestal lift type: Dual position Foreline type: Universal Injector size: 2" Module B: Chamber type: Shrink Chamber process: STI / IMD Process clean type: In-situ Module controller: MC1 Module turbo pump: MAG2000 Manometer 1(10T): MKS7 750B Throttle valve: MKS 153D-15973 ESC / Dome cooling: PCW Temperature monitoring: NTM500C Manometer 2(10T): MKS 750B HF Generator: AE RFG5500 LF Generator: AE PDX 8000 RF Match: Mercury 3013 Manometer 3(100m): MKS 629B Dual clean injector kit Injector type: Single Louvered screen Pedestal lift type: Dual position Foreline type: Universal Injector size: 2" Module C: Chamber type: Shrink Chamber process: STI / IMD Process clean type: In-situ Module controller: MC1 Module turbo pump: MAG2000 Manometer 1(10T): MKS7 750B Throttle valve: MKS 153D-15973 ESC / Dome cooling: PCW Temperature monitoring: NTM500C Manometer 2(10T): MKS 750B HF Generator: AE RFG5500 LF Generator: AE PDX 8000 RF Match: Mercury 3013 Manometer 3(100m): MKS 629B Dual clean injector kit Injector type: Single Louvered screen Pedestal lift type: Dual position Foreline type: Universal Injector size: 2" Power supply: 3￠, 5 Wires, 208V 2000 vintage.

Read More Close

NOVELLUS CONCEPT 2 Speed is a chemical vapor deposition (CVD) reactor equipment designed for building conformal thin films on large substrates. The system is engineered to provide high throughput and superior process control over the entire substrate surface. CONCEPT 2 Speed reactor utilizes a modular design which enables users to configure their deposition systems to best fit their exact requirements. NOVELLUS CONCEPT 2 Speed reactor features a low-pressure CVD chamber which is equipped with a single-line, single-pass showerhead. The showerhead is capable of rapidly and evenly distributing chemicals to the entire substrate. This efficient gas distribution technique helps to eliminate edge effects and provides a uniform, homogenous deposition rate over the entire surface. CONCEPT 2 Speed is constructed using only the highest-quality equipment. It is designed to meet the most stringent quality control requirements and to ensure a precise and repeatable deposition process. The unit is also engineered to be highly efficient, allowing users to make more metallization films faster and with less material, thus saving time and money. NOVELLUS CONCEPT 2 Speed reactor includes an advanced process control machine that is designed to maximize process performance and process yield. This tool features a reliable multi-parameter process control module, as well as intuitive user interfaces. Additionally, the asset can be configured to allow for remote monitoring, multi-chamber synchronization, and real-time yield management. CONCEPT 2 Speed is well-suited for use in a wide range of industries including microelectronics and solar panel production. The model is integratable with existing NOVELLUS Foundry solutions, providing users with a single source for all of their deposition needs. The advanced chamber design and process control of NOVELLUS CONCEPT 2 Speed reactor provides users with superior conformal thin-film deposition that is highly repeatable and efficient.