Used NOVELLUS CONCEPT 2 Speed #9146623 for sale

NOVELLUS CONCEPT 2 Speed reactor is an advanced, versatile chemical vapor deposition (CVD) tool that is used for creating semiconductor device layers in high-volume manufacturing. It is capable of processing substrates up to 350 mm in size, including advanced MPU and high-performance transistor designs. CONCEPT 2 Speed reactor from NOVELLUS features a flexible, multi-station architecture, allowing for high throughput and low cost-per-die production. The reactor includes a dual-reactor, dual-substrate processing equipment that enables simultaneous front and backside processing of large 300 and 350 mm wafers. It also features a comprehensive wafer handling mechanism that enables fast transfer between processing stations. The reactor utilizes advanced deposition processes and is capable of processing a wide range of materials, including hydrogen silsesquioxane (HSQ), polysilicon and silicate glass. It is designed to provide optimum temperature uniformity and precise layer thickness control throughout the entire substrate. The platform utilizes the high-pressure low-power mode to minimize the undesirable effects of excessive heating rates and to ensure repeatable deposition results. It further employs the vertical-aligners and re-aligners for substrate handling and positioning in the reactor chamber. The reactor includes a vacuum system that is capable of achieving high level of vacuum and maintaining it over a long period of time, ensuring reliable and repeatable CVD process. The pumping unit is equipped with an integrated capture machine that removes particles from the chamber, providing clean etch processing. NOVELLUS CONCEPT 2 Speed is designed for ultimate reliability and production throughput. It features a comprehensive set of monitoring, feedback and fault protection features that allow for the seamless integration of the platform into a production line. The reactor is further equipped with an advanced Electrostatic Chucks (ESC). These enable precise wafer clamping during wafer stages, with extremely low voltage values. CONCEPT 2 Speed is equipped with a data logging tool that can provide valuable data to users. The logging asset records yield, process history, recipe development, defect data and other key parameters, aiding the optimization of yield and throughput. To conclude, NOVELLUS CONCEPT 2 Speed is an advanced CVD reactor designed for high-volume, low-cost and repeatable deposition processing. It is equipped with comprehensive wafer handling and monitoring systems, enabling reliable downstream processing and high throughput. The reactor provides clean etching processes and is capable of processing a wide range of materials, from hydrogen silsesquioxane to silicate glass.