Used NOVELLUS CONCEPT 2 Speed #9146625 for sale

NOVELLUS CONCEPT 2 Speed
Manufacturer
NOVELLUS
Model
CONCEPT 2 Speed
ID: 9146625
Wafer Size: 8"
Vintage: 2000
System, 8" (3) Chambers 2000 vintage.
NOVELLUS CONCEPT 2 Speed reactor is a specialized piece of equipment that is designed to increase the speed of semiconductor fabrication processes while improving the consistency of the end product. This piece of equipment is used in the production of semiconductor devices such as integrated circuits, memory, and other sophisticated electronic components. CONCEPT 2 Speed reactor boasts a unique design that enables the highest possible fab rates for the best cycle time, while keeping contamination to a minimum. It is a two-zone, high-temperaturediffusion chamber, with independently heated annealing and deposition zones. The deposition zone holds the substrate on one of two elevators known as a "substrate elevator", which elevates the substrate to a temperature range of up to 850°C, allowing for precise deposition of the desired metals and materials. The annealing zone includes a rotary chuck which rapidly rotates and blends various metals and other materials together with the help of induction furnace technology. NOVELLUS CONCEPT 2 Speed reactor includes a specialized hardware and software platform called the "multi-system interface". This interface allows users to control, monitor, and adjust various parameters including temperatures, gas flow, pressure, turbulence, and other factors. The multi-system interface also enables the user to adjust recipes, monitor the reaction process, and receive feedback on the status of the reaction. In addition to the advanced hardware and software components, CONCEPT 2 Speed reactor also features a specialized gas delivery system which uses helium, argon, nitrogen, hydrogen, vacuum, and other specialty gases to optimize diffusion and deposition processes within the chamber. NOVELLUS CONCEPT 2 Speed reactor is an ideal solution for many different fabrication needs due to its ability to achieve a rapid cycle time and high fab rate. Furthermore, the reactor is designed to operate cleanly, with no particles to contaminate the silicon wafers and components. It is also highly efficient, utilizing less raw materials and energy to accomplish the same level of fabrication as compared to other similar reactors.
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