Used NOVELLUS CONCEPT 2 Speed #9189030 for sale

NOVELLUS CONCEPT 2 Speed is an advanced semiconductor-processing reactor that uses ultra-high vacuum (UHV) technology for precise thin-film deposition. This reactor is typically used in semiconductor fabrication plants to create intricate structures on the microscopic level. One of the primary design components of the reactor is its patented RF energy source, which is capable of controlling the deposition rate and thickness of deposited layers to extreme accuracy. The reactor also houses a multitude of other components that facilitate precise control of the deposition process and facilitate production to the exact specifications required by the customer. CONCEPT 2 Speed reactor utilizes a 40 cm diameters, crucible-type chamber which contains the UHV space, a set of heating coils, and various gas inlet and exhaust ports. The chamber is surrounded by two low pressure zones and a high pressure zone, which delivers reactive gases to the hollow substrate holder. This holder is also equipped with resistive heating tails and Faraday cages, which ensure precise deposition of materials with total control over ion beam energy. The power delivery equipment for the reactor is also able to supply precise RF energy for heated, inert gas, and reactive gas deposition processes. This system can deliver up to 500 kW of RF power and is controlled through software, utilizing real-time feedback from the process. Additionally, pulsed sorter techniques are employed with NOVELLUS Concept 2 Water Speed for ion beam etches, selective patterning, and other processes not available with other reactors. Cooling for NOVELLUS CONCEPT 2 Speed is accomplished through an immersion recirculator, which supplies cooling water to an inner ring in the chamber walls. This unit ensures that temperatures are maintained at optimal levels, ensuring accurate and precise deposition. In addition to these components, CONCEPT 2 Speed reactor also contains a computer-aided process control machine. This tool is able to monitor temperature and pressure, as well as the rate of deposition, while also providing the ability to fine-tune the deposition process. NOVELLUS CONCEPT 2 Speed is an extremely advanced and precise deposition reactor, perfect for a wide variety of applications. With its array of features, the reactor provides total control over the deposition process and allows for the production of intricate thin-film structures with extreme accuracy.