Used NOVELLUS CONCEPT 2 Speed #9301536 for sale

NOVELLUS CONCEPT 2 Speed
Manufacturer
NOVELLUS
Model
CONCEPT 2 Speed
ID: 9301536
Wafer Size: 8"
Vintage: 2001
CVD-HDP System, 8" Single chamber 2001 vintage.
NOVELLUS CONCEPT 2 Speed Reactor is a deposition system designed specifically for ultra-low temperature processes. Developed by NOVELLUS Systems, Inc., CONCEPT 2 Speed Reactor is a single-chamber tool with a hybrid linear cathode and powered by a DC pulsed arc. This unique design is capable of running processes at temperatures ranging from approximately 125°C to 175°C and enable the deposition of broader class of materials ranging from oxides to nitrides, or individual layers consisting of metals, silicides, and silicon related materials. NOVELLUS CONCEPT 2 Speed Reactor is designed to perform multiple processes in a single unit. These include but are not limited to film deposition, chamber cleaning, gas distribution, and electrode treatments. Each of the processes can be run independently or sequentially to optimize the process conditions. The reactor is also designed with a removable chamber, allowing for efficient and accurate quality control analysis. CONCEPT 2 Speed Reactor also has a built-in automatic showerhead configuration. This allows for even distribution of the process gases throughout the chamber, as well as controlling the temperature at the wafer surface. In addition, the cathode assembly is designed with two interchangeable components for metal or metal silicide deposition. The two components allow for individual or dual process power tuning. NOVELLUS CONCEPT 2 Speed Reactor has a larger footprint than previous reactor systems from NOVELLUS. This increases the interface area and provides a larger area for features that are critical for process optimization such as better uniformity and improved repeatability. The reactor also offers superior clean technology to eliminate particles or contaminants that can damage the wafer or components. CONCEPT 2 Speed Reactor operates in a self-contained environment, reducing process costs by eliminating the need for a vacuum system. In addition, the reactor has very low process gas flow rates and can be configured for efficient use of the process gases. And due to its design, the reactor is capable of running multiple processes with a single-chamber system and one set of vacuum sources. In conclusion, NOVELLUS CONCEPT 2 Speed Reactor is an excellent tool for ultra-low temperature processes. It has a larger footprint compared to previous NOVELLUS models and is designed with a hybrid linear cathode and automatic showerhead configuration, allowing for improved uniformity and repeatability. It is also capable of handling multiple processes in a single unit. CONCEPT 2 Speed Reactor offers superior clean technology and is highly efficient with lower process gas flow rates.
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