Used NOVELLUS CONCEPT 2 Speed #9389932 for sale

NOVELLUS CONCEPT 2 Speed is a high-speed reactor used in semiconductor manufacturing. It combines a number of advanced technologies to provide a cost-effective, high-performance solution for chipmakers to meet their tight deadlines and challenging accuracy demands. CONCEPT 2 Speed is a rapid inject/in-situ clean Plasma Enhanced Chemical Vapor Deposition (PECVD) equipment that enables rapid conformal film deposition with unparalleled uniformity, film-stress control and deposition rate capability. This reactor utilizes a number of integrated features that provide high performance deposition results. This includes a Krytox™ direct deposition drum with a shielded showerhead chamber, closed-loop RF generator control, and individualized quartz process component temperature control. The rapid gas exchange capability further ensures process stability and efficient gas-target usage. NOVELLUS CONCEPT 2 Speed is also equipped with a real-time substrate mapping system and advanced process control software. This allows the reactor to monitor substrates in situ and use the mapping data to precisely adjust process parameters as needed, ensuring perfect defect-free film deposition. CONCEPT 2 Speed also offers superior uniformity and precise thickness control with its two-zone treatment strategy. This allows it to quickly adjust the etch rate of the substrates to accommodate "layer-on-layer" and "bottom-up" fabrication processes, providing an incredibly high throughput. The reaction zone is integrated with radiative shielding ensures a high level of transfer efficiency while maintaining extremely low substrate temperatures. To further improve efficiency and cost effectiveness, the unit features an integrated Chemical Manangement Machine (CMS), which monitors and controls each component in the chemical process automatically. This ensures quality, high-pressure, and temperature control throughout the reactive process. NOVELLUS CONCEPT 2 Speed is one of the most advanced reactors on the market today. It is ideal for semiconductor fabricators who need a cost-effective and high-performing tool for their next generation processes. Its advanced features provide enhanced control, precise accuracy, and high efficiency deposition results that help chipmakers meet even the most demanding applications.