Used NOVELLUS CONCEPT 2 TiN #9206612 for sale

NOVELLUS CONCEPT 2 TiN (Thermal Intelligent Nitrogen) is a plasma processing reactor providing optimized deposition of conformal thin films over large substrate sizes. It has both high-throughput and high uniformity characteristics. CONCEPT 2 TiN reactor is manufactured by NOVELLUS Systems, Inc. and features a unique design that utilizes Thermal Intelligent Nitrogen (TIN) plasma to ensure even deposition over large site areas. The design includes a high-temperature chamber in which a nitrogen atmosphere is maintained. This environment is further optimized through the addition of a pulsed-DC power supply that creates a high-density, low sheath electric field. The unique combination of temperature, pressure and electric field in the chamber allows for the precise control of electron energy levels, providing the stability and uniformity for the deposition process. The gas is heated to a temperature between 200 and 300°C, then passes through a series of electrodes in the plasma chamber. The electrons are energized and ionized, resulting in a high-density and stable plasma environment. The deposition process begins with the vaporization of source materials, followed by the transport of the vaporized material in the nitrogen atmosphere. Upon reaching the chamber walls, plasma etching occurs. The generated plasma ions then deposit at substrate level and react with the surface atoms, creating the desired film. NOVELLUS CONCEPT 2 TiN reactor also features adjustable power levels, allowing the process engineer to fine-tune the deposition rate to meet the needs of each specific application. CONCEPT 2 TiN reactor is ideal for high-throughput depositions with exceptional uniformity. Its advanced operating parameters provide precise control of electron energy levels, ensuring accurate deposition and increased yield. The efficiency and precision of NOVELLUS CONCEPT 2 TiN reactor make it an ideal choice for the deposition of conformal thin films on large substrate sizes.