Used NOVELLUS CONCEPT 2 Triple Speed #9096021 for sale

NOVELLUS CONCEPT 2 Triple Speed is a CVD reactor designed for high-productivity epitaxy (HPE) and advanced lithography applications. It is designed to deliver superior CVD performance and is capable of extremely high rates of deposition with 200 nm/min uniformity and 0.5 nm/min non-uniformity specifications. It features three levels of power that can be adjusted to allow for optimal growth and surface planarity of all applicative epi structures. The Triple Speed reactor operates on a three-stage reaction chamber, where each level accounts for different levels of power. Firstly, a low power substrate stage is used to decrease the risk of crystal overgrowth and improve surface planarity. The second stage is a powerful medium plasma in order to create uniform growth conditions. Finally, a high-power hydrogen plasma is used for interlayer conformalization. Additionally, CONCEPT 2 Triple Speed is equipped with TurboStar technology, which promotes accelerated deposition by creating a focused plasma pocket based on the phase of the reaction chamber. This increases processing speeds while keeping uniformity and conformality high. The Triple Speed reactor is also designed to be compatible with a number of advanced addition tools and lithography optics. Its low cost of ownership structure ensures minimal maintenance and long term cost savings. NOVELLUS CONCEPT 2 Triple Speed is ideal for those looking to improve their manufacturing process by offering faster cycle times, improved yield, and high repeatability.