Used NOVELLUS Concept 2 Triple Speed #9203792 for sale

NOVELLUS Concept 2 Triple Speed reactor is a high-tech etch and deposition equipment designed to meet the stringent requirements of the semiconductor industry. It offers a unique combination of process versatility and fast cycle times, resulting in high-quality results at a lower cost of ownership. Concept 2 Triple Speed uses unified plasma technology, allowing it to handle both etching and deposition on a single platform. This gives the system the ability to process a wide range of materials, including metals, oxides, and polymers. It offers a high etch rate and low defectivity, with excellent aspect ratios and superior step coverage. The unit has three basic modes: planar, flat, and deep, with maximum aspect ratios up to 20:1 achievable in the deep mode. This allows for a wide range of process materials and applications, from shallow trench isolation (STI) to advanced interconnect structures. NOVELLUS Concept 2 Triple Speed is designed for easy and efficient operation, which results in faster setup times and less downtime for maintenance. Its design also allows for faster wafer transfer times, which can lower cycle times and improve throughput. The machine also has a number of features which enhance process stability. These include two gas channels, mobile media sources, and an improved gas delivery tool. This enables the asset to deliver cleaner, more consistent process results. The model also has a highly flexible architecture with a number of options to maximize process capabilities and throughput. This includes an integrated process engine, extended chamber configurations, and an automated cleaning solution. Finally, Concept 2 Triple Speed is designed to use less energy than other systems, making its operation more efficient and cost effective. Overall, NOVELLUS Concept 2 Triple Speed reactor is a powerful solution for the semiconductor industry. It offers high-performance, versatility, and cost efficiency, making it the perfect choice for a wide range of applications.