Used NOVELLUS CONCEPT 2 #152911 for sale

NOVELLUS CONCEPT 2 Reactor is a high-end plasma etch equipment for advanced semiconductor device fabrication. This system provides a variety of etch processes for etching a wide range of materials. It provides improved process control and uniformity compared to traditional etch systems. CONCEPT 2 Reactor is a multi-function reactor, capable of etching a variety of features with a wide selection of gases. It incorporates Intelligent Process Control (IPC) that automatically optimizes the process, while simultaneously monitoring the etch chemistry and substrate temperature. The advanced electro-tolerance feature restores uniformity after each recipe set-up. Additionally, the high capacity substrate handling unit offers increased throughput and improved recipe transfer time. The reactor's non-abrasive process machine also helps reduce wear on the etching chamber walls, resulting in a more uniform etch profile. Other features of the reactor include a real-time gas monitor, allowing the user to analyze process gases and quickly remedy any etch process issues. Additionally, the high-precision quartz plasma source ensures homogenous etching across all substrates, regardless of wafer size. The automatic end point control feature stops the etch process when the defect is still visible within the design. This helps to reduce the risk of feature collapse and erosion. Finally, the advanced etch recipes provided within NOVELLUS CONCEPT 2 Reactor further enhance the overall quality of the etch process. By using precise parameters based on the customer's desired results, it is possible to achieve extremely clean and uniform features. The IPC library can be used to store the recipes and process variables, allowing the user to quickly replicate etching profiles. In conclusion, CONCEPT 2 Reactor is a state-of-the-art etching tool that provides improved asset control, uniformity, and throughput. Its advanced features make it an ideal model for high-end semiconductor devices. With its precise process recipes and IPC library, NOVELLUS CONCEPT 2 Reactor helps ensure clean and consistent etching processes.