Used NOVELLUS CONCEPT 2 #293616585 for sale

NOVELLUS CONCEPT 2 (NC2) is a reactor designed for semiconductor manufacturing. It consists of a 6" low-temperature chemical vapor deposition (CVD) reactor, capable of performing ultra-high throughput deposition processes. Its high throughput, low cost, and flexibility make it an ideal tool for production ramp-up and technology migration. The NC2 has a patented pulsed/continuous process capability, which combines the advantages of both types of deposition. With pulsed processing, temperature is maintained while lasers are applied in a pulsed manner to reduce nitrogen content. Continuous processing is achieved when laser pulses are continuously emitted in a uniform manner. This combination of techniques allows for exceptional process control and optimization of growth rate, chemical composition, and film thickness. The NC2 also has an innovative split-flow process chamber, which enhances conformality for ultra-thin depositions. The split-flow chamber maintains a boundary between two gas flows that permits high conformality uniformity and uniform film thickness with minimal voids. The split-flow chamber is ideal for typical deposition temperatures of 350-450C and permits production of high-quality uniform coatings, even on difficult substrates. The NC2 has a zero-resistance cold wall equipment coupled with an advanced film adhesion system. This zero-resistance cold wall element results in higher deposition rates, enhanced wafer temperature uniformity, and greater uniformity in film thickness across the entire wafer height. The adaptive film adhesion unit helps reduce non-uniformity due to adsorptions, ensuring that optimal film formation can be consistently achieved. The NC2 is well-equipped to meet the challenges of many advanced manufacturing technologies. It has a pre-etch and post-etch weapon module capability, allowing deposition of layers with extreme conformality. In addition, secondary radiation sources can be added to the NC2 to extend its capabilities even further. This makes it an ideal tool for technology evolution and pilot production of non-volatile memory devices, OLED displays, biosensors, and more. In conclusion, CONCEPT 2 offers an innovative and cost-effective solution to the challenges of semiconductor manufacturing. Its patented pulse/continuous process provides excellent process control and film uniformity. Its split-flow chamber increases conformality on ultra-thin depositions. Its zero-resistance cold wall and advanced film adhesion machine offer greater uniformity across wafer height and reduced film deposition non-uniformity. Finally, its secondary sources add a powerful tool to the arsenal of advanced manufacturing technologies.