Used NOVELLUS CONCEPT 2 #293622194 for sale

NOVELLUS CONCEPT 2
Manufacturer
NOVELLUS
Model
CONCEPT 2
ID: 293622194
Wafer Size: 6"
Metal sputter, 6" Comes with 3PM.
NOVELLUS CONCEPT 2 is an advanced chemical vapor deposition (CVD) reactor designed for working with extremes of power, temperature, and time rate conditions. This equipment offers film deposition uniformity and precise control over layers of ultra-thin metal and dielectric materials, which makes it ideal for advanced optical, electronic, or semiconductor applications. The unique design of CONCEPT 2 includes a combination of radial and linear flow reactors, as well as a cold wall construction and advanced susceptor design for uniformity and durability. The radial flow reactor and susceptor are designed for efficient utilization of the thermal and flow energy, which helps to reduce the cooling time. This maximizes the substrate temperature and minimizes the cycle time, which allows for superior film deposition uniformity. NOVELLUS CONCEPT 2 also includes an advanced wafer cooling system that can rapidly reduce the substrate temperature to achieve uniform distribution of the material across the surface. The unit also utilizes an integrated temperature and flow control machine to maintain the stability of the process temperature and flow through the reactor. This ensures dynamic, consistent and repeatable process results throughout the life of the reactor. An advanced metrology tool helps to monitor all critical process parameters, and offers high precision measurements including layer thickness, doping levels, etch rates, wafer shape and contact potential. This asset also ensures high throughput and low cycle times by continuously monitoring deposition uniformity, dress rate and other substrate parameters. CONCEPT 2 features an innovative platform architecture that offers modularity and scalability for the most demanding applications. With its broad range of capabilities and advanced features, this model is ideal for applications that require superior film uniformity, precise control over layers and reduced cycle times. Whether used in micro-electronic, advanced optical, biomedical or consumer applications, NOVELLUS CONCEPT 2 provides an exceptional level of process flexibility and precision.
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