Used NOVELLUS CONCEPT 2 #9004475 for sale

NOVELLUS CONCEPT 2
Manufacturer
NOVELLUS
Model
CONCEPT 2
ID: 9004475
Wafer Size: 8"
Vintage: 2007
CVD system, 8" Dual-Speed-S SiO2 Process chamber Gas configuration: 1 Ar 500 sccm 2 O2 500 sccm 3 NF3 1 slm 4 SiH4 200 sccm 5 He 500 sccm 8 H2 2 slm MFC: Aera/FC-7800CD NC, Metal Seals 1/4”MVCR, 9pin D-Type Conn 10μin Ra (2) SPEED-S Module (STI): Module Controller Reactor Chamber Gas Box Exhaust System Pressure Measurement System LPB (Local Power Box) RF Supply & Output System APC (Auto Pressure Controller) Vent N2 Supply System He Supply System for ESC Temperature Measurement (NTM3) Cooling Water Supply System Compressed Air Supply System DLCM-X Module (Hi/Low Type) with SMIF: Standard SMIF TM Aligner System Controller (UI I/F) Module Controller (2) Load-lock Chambers Transfer Chamber Transfer Robot (Indexer for L/L x 2, Mag for TM x1) Slit Valve Turbo Pump (TMH260) Purge Gas, Vent Gas Supply System Cooling Water Supply System Compressed Air Supply System Exhaust System Pressure Measurement System Cooling Station LPB (Local Power Box) APC (Auto Pressure Controller) RF Generator HF Generator: (2) RFG 5500/AE LF Generator: CLF-5000/COMDEL Module single service drop, MSSD Δ-Y Transformer (Type 3-628941, 100KVA) UPS (“NemieLambda”PS-3210, “Hakkosha” 3WTC-10K) (2) SMIF Robots (Asyst) Missing / defects: Ch-1: HF generator failure, No HF Matching, No Coaxial Cable Ch-2: Isolation valve failure (100mTorr) 2000 vintage.
NOVELLUS CONCEPT 2 reactor is an advanced piece of semiconductor fabrication equipment designed to improve the quality and efficiency of production. It is a chemical vapor deposition (CVD) equipment which is used to deposit thin films of materials, such as polysilicon, on a wafer. This deposition process is an essential step in the production of integrated circuit devices such as microprocessors. CONCEPT 2 is a precision engineered tool developed by NOVELLUS Systems. It features a high-resolution, uniform silicon deposition process, as well as multi-process chamber etch capabilities. It utilizes advanced plasma chamber technology, enabling etching and deposition processes to be completed simultaneously, as well as providing complete control over the composition and chamber conditions. This provides extremely uniform deposition rates and film thickness, eliminating the need for additional adjustment steps. NOVELLUS CONCEPT 2 reactor uses a high-frequency generator and specialized induction coils to generate a large-area, uniform plasma. The plasma is then passed into a multi-stage plasma chamber, where it energizes the precursors delivered into the chamber. The combination of the energetic plasma and the chemistries react to produce the desired silicon film on the wafer. This eliminates the need for highly specialized and expensive pulsed magnetron coaters. CONCEPT 2 reactor features a computer-controlled process system, and incorporates advanced diagnostic capabilities and temperature control. An inert gas atmosphere is used to maintain purity levels within the chamber itself, and the vacuum unit has an extremely rapid response time, allowing for quick in-process adjustments. The data acquisition machine is also capable of power monitoring, chamber pressure readings, and temperature measurements, ensuring the optimal environment is maintained. NOVELLUS CONCEPT 2 reactor offers outstanding film uniformity and control, enabling precise control over process parameters. This results in excellent quality products with extremely high yields and yields of workable units. In addition, the capability to produce multiple deposition layers in a single run makes CONCEPT 2 extremely versatile. This makes it an excellent choice for semiconductor manufacturers looking to increase their production efficiency and reduce waste.
There are no reviews yet