Used NOVELLUS CONCEPT 2 #9071448 for sale

NOVELLUS CONCEPT 2 is a chemical vapor deposition (CVD) equipment, a type of reactor used to coat surfaces with thin layers of various materials. CONCEPT 2 is often used to create thin layers of films on semiconductor substrates and other interconnects, such as copper, gold, titanium, and aluminum. NOVELLUS CONCEPT 2 features extremely high deposition rates and precision control. It features an innovative slab susceptor design, which helps ensure that the films are consistently and evenly deposited. This design also reduces the possibility of damage to delicate thin film layers due to differential thermal expansion. CONCEPT 2 system is capable of ramping up deposition rates quickly and accurately. It features two on-board shakers which work to maintain the uniformity of the substrate layer during film growth. It also has a heated exhaust unit which helps drive away any off-gas and can help reduce contamination of the substrates. NOVELLUS CONCEPT 2 is also highly modular, allowing it to be expanded with three additional Substrate Heat Data Acquisition Systems, making it ideal for complex growth processes. The modular design also makes CONCEPT 2 exceptionally easy to use, as components can be easily replaced or upgraded as necessary. NOVELLUS CONCEPT 2 has a clean room ready design, with all of the necessary components being ISO-14644 compliant. It has three independent chambers, all of which are continuously monitored for pressures and temperatures. This provides maximum flexibility to users, allowing them to create films that are consistent and of the highest quality. CONCEPT 2 is an excellent choice for those looking for a reliable CVD machine for creating high-quality thin films. It is a highly modular and versatile tool that can be easily adapted to a variety of specific applications. Thanks to its precision control and high deposition rates, NOVELLUS CONCEPT 2 is an ideal choice for all types of thin film applications.