Used NOVELLUS CONCEPT 2 #9071449 for sale

NOVELLUS CONCEPT 2 reactor is a CVD reactor used primarily for the deposition of silicon dioxide films for semiconductor wafer processing. It is a simple deposition process, using a type of gas mixture that consists of oxygen and Silane, also known as siloxane. The gas mixture enters the chamber from the gas supply and then flows through the reaction zone. Here, the silane gas is decomposed by the heat generated by the electric current passed through the reaction zone. Subsequently, the byproducts oxygen and silicon-dioxide are deposited on the wafer surface. CONCEPT 2 reactor provides direct deposition, due to the direct-current cyclical-waveform generating an electric field across the gas/solid interface, which accelerates the reaction at the wafer surface. The resultant deposition occurs at a fast rate and is uniform across the entire wafer. NOVELLUS CONCEPT 2 also provides independent control of temperature, pressure and gas flow within the chamber. CONCEPT 2 reactor is composed of a thermally insulated quartz reaction chamber, an electrochemical heating element, an exhaust equipment, vacuum pump, gas delivery system and control and monitoring systems. The electrochemical heating element utilizes the electric current produced in the reaction zone for heating the reaction chamber, while the exhaust unit acts to remove the generated byproducts. The vacuum pump provides the necessary depleted pressure in the chamber for the reaction, while the gas delivery machine supplies the necessary gas mixtures. NOVELLUS CONCEPT 2 reactor has several advantages over other CVD processes. Firstly, it requires minimal maintenance and can be operated at a low temperature and pressure. Furthermore, due to its direct-current cyclical-waveform generation, it has a faster deposition rate and offers better uniformity across the entire wafer. Lastly, it has a relatively low power consumption, which coupled with its low-maintenance requirements make it a highly viable option for industrial applications.