Used NOVELLUS CONCEPT 2 #9100803 for sale

NOVELLUS CONCEPT 2 is an advanced chemical vapor deposition (CVD) reactor designed for use in semiconductor fabrication facilities. It is the precursor to NOVELLUS Concept 3 and one of the first platforms to introduce the use of dual-dielectric toroidal sources. It is especially suited for applications such as metalorganic CVD and selective deposition, as well as for lower temperature processes like phosphorus and silicon nitride deposition. CONCEPT 2 is an inline CVD reactor designed to provide high productivity, process uniformity, and equipment reliability. The system utilizes dual-dielectric toroidal sources to increase the effective substrate area and reduce generated particle levels in the reactor. This feature allows for an increase in the total number of substrate wafers and higher throughput without sacrificing performance. The thermally durable quartz chamber provides excellent temperature control, with the potential of reaching temperatures of up to 1000°C. The chamber has also been proven to effectively sustain multiple process cycles, allowing for multiple runs without needing to be redressed or packaged. NOVELLUS CONCEPT 2 utilizes its two-dimensional pulsed-power source to support a variety of process recipes. This technology allows for fully optimized process recipes tailored to the demands of each individual substrate. This in turn provides users with the unique ability to control etch profiles, deposition uniformity, line-width control, and temperature profiles across the entire wafer. Additionally, CONCEPT 2's robust repair and deposition options allow for high-precision, customizable device components. With NOVELLUS CONCEPT 2, users can also benefit from its automated wafer-transferming unit. This ensures that all substrate wafers are aligned, centered, and positioned through multiple reactors via a precise mechanical conveyance, utilizing a proven non-contact, collimated beam-steering technology to transfer the wafers between chambers. CONCEPT 2 is an extremely impressive chemical vapor deposition reactor. With its dual-dielectric toroidal sources, robust repair and deposition abilities, two-dimensional pulse-power source, and automated wafer-transferming machine, users can benefit from greater levels of productivity, uniformity, and tool reliability.