Used NOVELLUS CONCEPT 2 #9113843 for sale

NOVELLUS CONCEPT 2 is a chemical vapor deposition (CVD) reactor used primarily for depositing layers of materials onto various substrates. It is capable of performing low-temperature CVD processes, as well as high-temperature CVD processes, for both the deposition of metal and semiconductor films. It is also equipped with a process monitoring and control system. CONCEPT 2 utilizes two horizontally mounted quartz shower heads with three deposition sources to deposit layers of materials onto substrates. The quartz shower head is surrounded by an annular reflection chamber, which is heated using an electrical heating element. The substrates are placed on a substrate holder which is heated using a gas-fired infrared lamp and enclosure. The gases used in the deposition are metered, blended, and delivered to the deposition chamber using mass flow controllers and an automatic flow controller. NOVELLUS CONCEPT 2 is equipped with a wide range of diagnostics designed to monitor the CVD process. Included are a variety of infrared detectors, thermocouples, quartz crystal microbalances, and quartz crystal oscillators. These diagnostics allow for quick identification of the chemical species present in the CVD reaction and for the adjustment of process parameters in order to ensure uniformity of deposit films. In addition, CONCEPT 2 is equipped with a computer system which permits control of the deposition process and monitoring of the process history. Users are able to modify the process parameters in real time, thus allowing for adjustments to be made as needed. The system also allows users to enter and access a variety of recipes which permit automated programs to be executed. NOVELLUS CONCEPT 2 is a versatile tool capable of producing a wide range of precision deposits for a variety of applications. It is an essential component in semiconductor and information technology manufacturing, allowing for uniform deposition of materials for an array of applications.