Used NOVELLUS CONCEPT 2 #9179262 for sale

NOVELLUS CONCEPT 2 equipment is a type of an ultra-high-density Plasma Enhanced Chemical Vapor Deposition (PE-CVD) system, designed for advanced semiconductor fabrication. This unit is ideal for applications requiring the deposition of thin films for advanced device and materials development due to its capability for extremely precise deposition. The machine features three main deposition chambers with an MRC (multi-ring concept) design. The MRC is based on the concept of multiple plasmachemical reaction sites within a single chamber. It has a two-stage, single-stage, and multi-stage rotation deposition ring, allowing for a wide range of thickness control and uniformity across the wafer surface. The tool is also capable of producing a variety of complex thin films using PE-CVD, such as specialty materials, barrier layers, and transparent oxide films. The asset is equipped with an advanced load lock, allowing wafers to be loaded directly into the chambers without breaking vacuum. The chambers have a wide range of atmospheric and pressure control capabilities, and are capable of processing up to 24 wafers at a time. The model is also designed with an advanced exhaust equipment, allowing for safe and efficient removal of waste material and preventing buildup in system components. CONCEPT 2 also features an advanced plasma source, allowing for precise control of the energy input during deposition. This advanced source uses a dynamic frequency change technique to deliver uniform plasma power density across the entire wafer surface. The unit is also equipped with a variety of advanced diagnostic and metrology systems, designed to check the quality of the deposited films and ensure uniformity across the entire wafer. In conclusion, NOVELLUS CONCEPT 2 machine is a highly precise and efficient PE-CVD tool, designed for advanced semiconductor fabrication. Its capabilities for precise deposition of thin films and uniformity across the wafer surface make it ideal for device and materials development applications. Through its advanced load-lock, chamber pressure and atmosphere control, advanced plasma source, and advanced diagnostic and metrology systems, NOVELLUS Concepts 2 is capable of delivering state-of-the-art thin film deposition for a variety of applications.