Used NOVELLUS CONCEPT 2 #9186060 for sale
URL successfully copied!
Tap to zoom
ID: 9186060
Wafer Size: 8"
CVD System, 8"
Sequel chamber
Modified reduced foot print frame
Missing parts:
Meter, DC, press, digital, leak back
Switch / Gauge photohelic
Gas lines plumbing (ALL)
MFC Cable (ALL)
Gas box cabling (ALL)
Numerous system cable (99% Gone)
Lower lift / Rotate assembly (Spindle)
Top plate: Except (4) panels
Intact items or present items:
Vacuum general adapter AC-2
EUROTHERM Heater controller
Heater feed through
RF Isolated TC (Filter)
Valve, throttle, vacuum control
Valve, gate, high vacuum
Upper spindle assembly
Heater block
(5) Shower heads
Fork plate / Ceramic forks
MYKROLIS MFC Gas panel (No plumbing)
Top plate: Lift assembly
Local power box (LPB)
Mega pac: MP5-95532
IOC 27-10318-00 Rev B
Shunt cap (For tune)
Temporary / Pressure control box.
NOVELLUS CONCEPT 2 is a single wafer batch chemical vapor deposition (CVD) reactor designed to meet the demanding needs of the semiconductor industry. CONCEPT 2 reactor is capable of performing advanced processes at higher throughput speeds in order to achieve higher yields and lower product costs. NOVELLUS CONCEPT 2 reactor is designed for deposition processes including tungsten and silicon-based films, such as Ti/TiN, SiOC and BCB. The reactor offers superior performance without compromising yield. It features a unique design configuration with a powerful electro-dynamic head designed to better control process chamber conditions. It is equipped with multiple internal electrodes for better uniformity and reduced electro-magnetic interference. CONCEPT 2 reactor can also easily connect to other deposition tools using the transfer robot. NOVELLUS CONCEPT 2 is available in a 6 inch diameter or 8 inch diameter and offers a variety of process options including single wafer, batch, multi-zone and multi-chamber processing. It utilizes a real-time, multi-segment temperature control system for precise process control and stability. The system is powered by a serial high-performance embedded processor for optimal operation. CONCEPT 2 supports both continuous ceramic gas injection delivery and on-demand dosing with its M4 injector. It also has a coolair peripheral system that can be attached to intake and exhaust valves to reduce unwanted heat load and provide a clean, dust-free process environment. NOVELLUS CONCEPT 2 can be easily integrated into new or existing systems with its powerful and intuitive software. The process gains and parameters are easily set up and monitored, and the real time process data can be used to detect potential issues and maximize yields. Overall, CONCEPT 2 is an efficient, high-performing CVD reactor for advanced processes. It is designed with exceptional precision and performance, and with its intuitive software and advanced process control, it is a great choice for achieving high yields and lower product costs.
There are no reviews yet