Used NOVELLUS CONCEPT 2 #9188214 for sale

NOVELLUS CONCEPT 2 is a continuous single-wafer reactor that provides manufacturers with an innovative approach to high-quality production of microelectronic devices. It is a unique system delivering solutions in deposition, oxidation, nitridation and etching operations and enables unprecedented uniformity with maximum throughput. CONCEPT 2 reactor is composed of a vacuum chamber, an RF plasma source, an inductively coupled plasma generator, a unique solid-state wafer holder and a set of process modules. The chamber is thermally isolated from surrounding electronics, while an internal light pipe and shutter system allows visualization of the process inside the reactor. The RF plasma source is the heart of NOVELLUS CONCEPT 2 and consists of three-level designs for predominantly oxide, nitride or etching processes. It helps maintain an optimal balance of ion energy and flux across the wafer for precise layer-by-layer deposition control and superior uniformity. The onboard inductively coupled plasma source is capable of generating different radical species for etching or cleaning operations. The solid-state wafer holder is a key component of CONCEPT 2, providing a quick and reliable mechanism for transferring wafers between the reactor and process modules. The holder enables precise wafer control both vertically and horizontally to compensate for any non-uniform loading conditions. NOVELLUS CONCEPT 2 reactor also includes a set of advanced process modules designed to enhance performance and uniformity, including: a high-performance oxidation module for controlled performance and ultra-smooth layers; a low-temperature nitridation module to tap into the rich TDD and BTI epitaxial growth that oxide process cannot provide; and an advanced etching module for highly accurate etching/cleaning operations. This is coupled with the ability to control multiple variables in the deposition/etching chamber from within the machine. These capabilities enable unparalleled uniformity and total control over the device structure and microfeature dimensions. CONCEPT 2 is easily upgradable, allowing customers to switch between oxide, nitride or metal processes in a single reactor. This flexibility enables the production of a wider range of microelectronic devices with high quality and lower cost than previously possible.