Used NOVELLUS CONCEPT 2 #9206050 for sale

NOVELLUS CONCEPT 2 is a high-performance, plasma-enhanced chemical vapor deposition (PECVD) reactor designed for advanced thin-film fabrication. CONCEPT 2 reactor utilizes a patented sputter-enhanced showerhead design that provides highly uniform thin-film deposition on large substrates. The sputter-enhanced showerhead design also allows for the deposition of thicker films at a higher rate than is possible with a conventional showerhead. NOVELLUS CONCEPT 2 reactor has a large process chamber volume which enables the deposition of thicker films with high throughput. CONCEPT 2 reactor is a two-zone system which includes a main chamber with a substrate-receiving portion, which is connected to a reaction chamber through a process channel. The process channel provides a continuous flow of process gases from the reaction chamber to the substrate-receiving portion. NOVELLUS CONCEPT 2 reactor is equipped with a high-frequency, dual-frequency RF source which supplies energy to the substrates and process gases in the reaction chamber. The dual-frequency RF source provides the ability to adjust the plasma parameters for different thin-film processes. CONCEPT 2 reactor is highly configurable and can be tailored for specific processes. It is capable of processing wafers up to a diameter of 300 mm, making it an ideal choice for 3D-IC applications. The reactor provides flexibility in controlling the concentration of process gases and RF power levels. A patented gas manifold system with feedback control allows for rapid and precise adjustment of the gas flow rates and gas residence time in the reaction chamber. NOVELLUS CONCEPT 2 reactor is designed to address the increasing needs of modern IC technology. Its high throughput and flexibility, combined with its extensive lines of accessories, make it an attractive choice for a wide variety of thin-film applications. CONCEPT 2 offers unique features to optimize advanced process performance, enabling the fabrication of high-performance devices and circuits with superior results. NOVELLUS CONCEPT 2 is a reliable, cost-effective tool with a small footprint for semiconductor applications. It offers a high degree of automation with precision process control, high quality deposition, and process uniformity. Its advanced metrology and diagnostic capabilities maximizes process stability and efficiency. Additionally, its low-cost maintenance and long life makes it an attractive choice for long-term projects. CONCEPT 2 is a powerful tool for advanced thin-film deposition, and is the ideal choice for industrial fabrication in today's semiconductor industry.