Used NOVELLUS CONCEPT 2 #9212169 for sale

NOVELLUS CONCEPT 2 is a medium-scale, low-pressure chemical vapor deposition (CVD) equipment designed for the high-volume production of thin-film integrated circuits. It uses a single chamber process for oxide and nitride deposition, and provides a high rate of throughput with low defect rates. CONCEPT 2 offers exceptional performance with ten deposition sources that provide extraordinary uniformity across the substrate surface. NOVELLUS CONCEPT 2 is built with a low-pressure reactant flow, with controlling pressures specifically designed for oxide and nitride deposition. The chamber has a closed, cylindrical design with a two-zone, high-speed thermal process that utilizes a multi-gas system. It has two internal gas manifolds which allow for higher total gas flows for enhanced uniformity, and an optional internal barrier layer for even greater throughput. A precisely controlled parabolic RF energy field is used to ionize the reactant gases. This causes reactions to occur at the wafer surface, ultimately resulting in the deposition of a thin-film layer. CONCEPT 2 is equipped with a high-rate, multicomponent gas delivery unit. This machine maintains controlled reactant pressures and provides excellent uniformity. NOVELLUS CONCEPT 2 uses a self-aligning lateral mass flow meter to ensure stable and repeatable pressure patterns and accurate gas flow rates. Additionally, the chamber uses separate mass flow controllers and manifold pressure controllers for each reactant gas. This helps to ensure a high level of controllability and precision gas delivery throughout the deposition process. CONCEPT 2 also offers a substrate heating tool that is identical to the leading stand-alone CVD systems. This asset ensures exceptional temperature uniformity and repeatability for a variety of substrate types. The heating model is also adjustable, allowing users to tailor the temperature profile to their specific substrate and process requirements. The combination of these advanced features leads to an overall improvement in process control, as well as improved throughput and etch quality. To further enhance process performance, NOVELLUS CONCEPT 2 utilizes advanced shower head technology. This technology increases throughput and uniformity by using independent gate valves at each shower head port which improves the distribution of reactant gases and prevents the accumulation of unwanted byproducts. The addition of shower head technology results in a significantly improved process window and uniformity across the entire substrate surface. In summary, CONCEPT 2 is a low-pressure CVD equipment designed for high volume and superior substrate uniformity. It is ideal for the large scale processing of thin-film integrated circuits. The advanced features of the system, such as multi-gas delivery, parabolic RF energy field, and shower head technology, make it a powerful and reliable tool in the often challenging CVD environment.