Used NOVELLUS CONCEPT 2 #9212229 for sale

NOVELLUS CONCEPT 2
Manufacturer
NOVELLUS
Model
CONCEPT 2
ID: 9212229
Vintage: 2006
CVD System (2) Loaders 2006 vintage.
NOVELLUS CONCEPT 2 is a high-density plasma reactor used for etching in the semiconductor industry. It is a single-chamber vertical-type reactor and has a modular design with a detailed process control equipment, allowing for high-precision etching of wafers. The system is built with a vacuum chamber, a gas supply unit, RF (Radio Frequency) power supply systems, and a process monitoring machine. The process takes place inside a metal chamber, which is hermetically insulated to maintain a near-vacuum environment inside. Vacuum is a necessary condition for the etching process, and is one of the fundamental requirements for the success of an etching process. Gas molecules, especially oxygen and hydrogen, are used as etchant and reductant to etch the material from the wafer surface. Precise control over the gas flow and formation of plasma is essential for the success of the process. The reactor utilizes an RF frequency of 13.56 MHz and a power level up to 1500W to generate a glow discharge and form reactive species, which is used to etch a desired pattern on the wafer surface. The RF power, gas flow, and operation temperature of the tool are accurately controlled by the company's advanced control asset. The RF power supply model is responsible for driving the RF generator. It provides precision control for the input power, ensuring that the power is accurately supplied to the generator. The gas delivery equipment provides accurate control over the gas flow, allowing for precise compositional control of the etch gases in the system. The temperature of the unit is monitored and controlled through a thermal sensor and a thermal controller, respectively. The process monitoring machine is responsible for monitoring the wafer during the etching process. The tool allows for real-time observation of the etching process, enabling operators to optimize the process for higher yields and higher yields. CONCEPT 2 is a versatile and reliable etching asset designed to meet the most rigorous demands of the semiconductor industry. Its modularity and precise process control guarantee the highest etching quality across the industry. The company provides complete maintenance and technical support solutions for its customers, allowing for a worry-free installation and operation of its high-powered etching model.
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