Used NOVELLUS CONCEPT 2 #9251350 for sale

NOVELLUS CONCEPT 2 is a popular multi-station CMP (Chemical Mechanical Polishing) reactor, designed to provide improved polishing performance and high throughput, while reducing overall costs. CONCEPT 2 was developed for and is widely used in semiconductor production, as it combines the polishing chamber, carrier system, and in-situ monitoring to maximize process efficiency. NOVELLUS CONCEPT 2 is designed to be a full-feature CMP reactor, offering a variety of features and capabilities to optimize the polishing performance. CONCEPT 2 utilizes a combination of gas horizontal and slurry flow called TrimodalTM to improve process uniformity and reduce chemical consumption. This feature allows the individual settings of the gas, slurry, and pressure levels to be optimized for the specific process of each polishing recipe or application. In addition, the standard Modulated Load Control (MLC) feature optimizes the pressure distribution over the wafer during polishing to ensure surface uniformity across any single wafer, as well as an entire production lot. The heart of NOVELLUS CONCEPT 2 is its control system. This includes the most up-to-date CMP recipes that can be easily transferred from station to station via the serial control bus. The control system is capable of monitoring factors such as force, rotational speed, temperature, and pressure. It also uses parametric feedback on parameters such as film thickness, surface roughness, and uniformity that are critical for successful polishing. CONCEPT 2 reactor has earned its place in the semiconductor application industry as one of the premier CMP reactors. It offers reliable, efficient, and cost-effective polishing performance, with the possibility of reducing CMP costs up to 30%. The combination of its advanced features, with its exceptional performance, makes it the ideal tool for most production runs.