Used NOVELLUS CONCEPT 2 #9251351 for sale

NOVELLUS CONCEPT 2 is a chemical mechanical planarization (CMP) reactor designed for semiconductor manufacturing. It is an advanced tool that offers improved performance and productivity compared to other CMP systems. It is used to create highly uniform and planarized surfaces on the semiconductor wafer, ensuring the proper electrical connections of the final product. CONCEPT 2 reactor utilizes a rotating pad head to create a consistent level of contact between the wafer and the polishing pad. This allows for more uniform polishing of the wafer surface. The reactor also features an improved water delivery equipment which further increases the uniformity of the polishing process. The water delivery system increases the planarization rates up to 40% and can be adjusted depending on the application. Additionally, the new reactor has a substantially decreased noise level and a more efficient thermal management unit which helps extend component life. NOVELLUS CONCEPT 2 reactor utilizes a variety of sophisticated features, such as tilt correction, various pressure controls, and advanced feedback regulation, to improve surface uniformity and reduce cost of ownership. The tilt correction feature ensures that the base pressure of the wafer stays consistent throughout the polishing process. The pressure control systems allow for precise control over the amount of pressure applied to the wafer. This parameter can be adjusted to avoid creating heat spots, reducing wafer damage, and improving polishing results. The advanced feedback regulation machine monitors the process parameters, allowing for real-time optimization of the polishing process. In addition to the advanced technology CONCEPT 2 reactor offers, it is also more efficient than other CMP reactors. The improved thermal management tool, advanced nozzle design, and optimized process control help reduce product temperature and reduce material loss. This leads to faster cycle times and higher yields. NOVELLUS CONCEPT 2 reactor also offers superior user control and diagnostic capabilities. The reactor is compatible with advanced process control and production management systems that allow users to closely monitor the operation of the reactor and correct any problems that may arise. Overall, CONCEPT 2 CMP reactor offers improved performance, greater efficiency, and improved user control capabilities. The advanced technologies incorporated in this reactor make it the perfect choice for meeting the complex demands of semiconductor production.