Used NOVELLUS CONCEPT 2 #9315487 for sale

NOVELLUS CONCEPT 2 reactor is an environmental-friendly Reactive Ion Etching equipment designed to provide precise etching capabilities with high-density plasma. The reactant gases are heated to ionize the gas making up the plasma, allowing the gas to be accelerated toward a metallic surface. When the reactant ions hit the metal, the energy of the individual ions is expended to remove metal atoms from the surface. In addition, this enables a high degree of control over the etch process to create a uniform substrate. This is the approach taken by CONCEPT 2 solution. NOVELLUS CONCEPT 2 system enables users to achieve higher productivity, longer run-times, and improved process control. It is capable of handling layers of any thickness, from ultra-thin films to thicker structures. The flow rates can be finely adjusted inorder to create the required etched structures. The unit includes several features that are designed to protect the environment and ensure the highest level of cleanliness during the operation. This includes an air recycling machine to filter out any particles, a second wall at the feedpoint to prevent any reactants from leaking into the outside environment, as well as a dedicated exhaust line that directs any reactions away from the production areas. CONCEPT 2 tool is designed to be very efficient, providing up to 30% fewer processing steps than other RIE systems. The entire asset, including power supplies and controllers, are sized to the application, so users can customize their setup as needed. The model also includes an optional Current Tuning feature which allows users to adjust the power settings in order to achieve ideal results. This is a useful feature as it saves time and improves equipment performance. NOVELLUS CONCEPT 2 also comes with a full set of control functions. These enable users to precisely control the process parameters, such as etch rate, temperature, gas flow, and pressure. In addition, the system can be monitored and adjusted remotely via a graphical user interface. This ensures that the desired etch result can be achieved in a consistent manner. Overall, CONCEPT 2 is a highly capable etching unit that offers precision and advanced control features. By significantly reducing processing steps and with its robust safety protocols, NOVELLUS CONCEPT 2 is well suited for a variety of applications, from thin film etching to advanced device fabrication.