Used NOVELLUS CONCEPT 2 #9316802 for sale

NOVELLUS CONCEPT 2 is a chemical vapor deposition (CVD) reactor designed to deposit silicon nitride, silicon oxide, and other dielectric and barrier films. It is used in semiconductor device fabrication processes such as copper interconnects, diffusion barriers, and protective layers. CONCEPT 2 reactor is capable of delivering superior performance and reliability over traditional methods thanks to its innovative design and high-quality components. NOVELLUS CONCEPT 2 reactors utilize a rectangular reaction chamber, a wafer boat substrate holder, and an advanced gas delivery system to provide an effective CVD process. This system is powered by an advanced software package and controller to maximize the CVD process efficiency. CONCEPT 2 reactor is equipped with a three-electrode magnetron sputtering source, a DC plasma source, a low-voltage (LV) source, and a high-voltage (HV) source. The magnetron sputtering source provides uniform deposition of thin layers of nitrides and oxides while the DC plasma source is used for planarized layers of nitride and oxide. The LV and HV sources provide additional functionality including plasma-enhanced chemical vapor deposition (PECVD), silicidation, and ion plating. To protect the substrates from contamination, NOVELLUS CONCEPT 2 CVD reactor is designed with several features that ensure a clean and uniform deposition. First, the proprietary Jetfilm protection module isolates the deposition process from chamber contaminants and prevents backstreaming of fluorine-containing species. The reactor also uses high-efficiency filtered lifts, low-temperature wafer-loading systems, and corrosion-resistant heaters to minimize impurity buildup inside the chamber. CONCEPT 2 is further designed with high-precision automation and controls to help ensure reliable process performance. It provides a robust and accurate wafer boat positioning system, advanced recipe execution capabilities, and several features to ensure uniformity and repeatability of the deposition process. NOVELLUS CONCEPT 2 reactor is a highly versatile tool capable of meeting any device requirements for cutting-edge applications in dielectrics and barriers.