Used NOVELLUS CONCEPT 2 #9408537 for sale

NOVELLUS CONCEPT 2 is a chemical vapor deposition (CVD) reactor designed for high-volume manufacturing of thin-film deposition processes. It is especially suitable for multi-layer thin-film applications in the semiconductor industry. CONCEPT 2 utilizes a dynamic processing technology with a number of unique features to deliver industry-leading performance. The structure of NOVELLUS CONCEPT 2 is a single-piece, stainless-steel construction vessel which is lined with a corrosive "solution" to deliver efficient, cost-effective processing. The reactor uses independent heating zones to achieve efficient and repeatable processing of materials. Each zone has independent heating and cooling capabilities to provide precise process control. CONCEPT 2 also features a closed-loop feedback equipment that enables real-time control of the deposition process. This system allows for precise control of the temperature and pressure within the chamber, and with the use of an in situ deposition rate monitor, it is able to accurately control the deposition rate. NOVELLUS CONCEPT 2 reactor ensures optimal chamber protection in order to maintain cleanliness and prevent any contamination of the chamber surfaces. It has two isolation valves, two O-rings, and two film-isolated seals to isolate the chamber from outside atmospheres, as well as special dust emission unit to reduce the levels of dust and particles produced during operation. CONCEPT 2 offers highly accurate process conditions for repeatable and reliable results. It automatically monitors machine pressure, temperature, and other parameters ensuring correct conditions for deposition accuracy and yields. It uses a multi-zone architecture for uniform and precise control of deposition rates. The tool also features real-time data feedback, allowing for much more precise control than is possible with other CVD reactor technologies. In addition, NOVELLUS CONCEPT 2 boasts an easy-operator feature to ensure economic and efficient operation of the asset with minimal maintenance. This includes automatic wafer loading and unloading, temperature and pressure control systems, and a built-in in situ rate monitor. Furthermore, CONCEPT 2 is compatible with several different source technologies, allowing for incredibly versatile capabilities. Overall, NOVELLUS CONCEPT 2 reactor is an excellent choice for accurate, repeatable, and reliable thin-film deposition processes. Its dynamic processing technology, superior chamber protection, independent heating zones, and real-time feedback systems make it the perfect choice for high-volume applications in the semiconductor industry.