Used NOVELLUS Concept 3 Altus Max #293802355 for sale

NOVELLUS Concept 3 Altus Max Reactor is a highly efficient process tool designed for the most advanced semiconductor device fabrication processes. It is used in the manufacturing of high performance integrated circuits. Concept 3 Altus Max Reactor is a one-of-a-kind tool, offering superior production volume by maximizing productivity and throughput with advanced integrated process automation and control. NOVELLUS Concept 3 Altus Max Reactor utilizes a chemical vapor deposition (CVD) process to deposit precise film thickness with uniformity to nanometer levels. The reactor design employs high-speed pulsing, hot-wall processing, and low infiltration technologies to reduce process time and eliminate unnecessary wafer handling. In addition, the system allows for repeatable manufacturing operations with minimal downtime ensuring a high yield of quality devices. Concept 3 Altus Max Reactor is equipped with a large variable sidewall height, allowing for simultaneous large- and small-area substrates. The variable sidewall height also enables increased plasma production for improved film deposition rates. The reactor architecture also provides excellent process control with adjustable sources, adjustable pressure, and adjustable temperature. The process is also protected from impurities through purging before and after every operation. The integrated process automation and control of NOVELLUS Concept 3 Altus Max Reactor allow for a range of production options including comprehensive online data logging, real-time feedback, and autocorrection. The advanced process control is enhanced with predictive analytics and automated cycle mapping. All these facilitate faster wafer processing, reduced energy costs, and minimized production time. Concept 3 Altus Max Reactor is designed for advanced technology nodes with the ability to process 200 - 500 mm wafers at improved speeds and provides consistent and repeatable process results. The tool can run multiple materials such as silicates and oxides, and offers integrated RF power control for improved film deposition. In conclusion, with its high throughput, superior process automation and control, and flexibility NOVELLUS Concept 3 Altus Max Reactor is an excellent choice for the most advanced semiconductor process fabrication.