Used NOVELLUS Concept 3 Altus #293638913 for sale

NOVELLUS Concept 3 Altus is a chemical vapor deposition (CVD) reactor designed for semiconductor production. It uses a plasma-enhanced thermal process to deposit a variety of dielectric and metal films onto substrates such as semiconductor wafers. The Altus incorporates advanced features to improve performance, vapor delivery, and uniformity, enabling accurate layering of thin films. The Altus is powered by an RF source that sustains an argon or helium-based plasma within the reactor chamber. The substrate is exposed to microwaves, generating heat that evaporates and decomposes precursors into super atomic-sized molecules. These super atoms travel over the heated substrate, attaching to previously deposited atoms, and forming an even film of uniform thickness. The Altus offers advanced control of process parameters, delivering pulsed feeding and adjustable bias voltage to deliver precision etching, offer uniform film deposition and improved throughput. Rapid precursor exchange also minimizes contamination between different sequences. The Altus also boasts a unique chamber design that results in better uniformity, with a quick-change brush assembly for precision cleaning. The Altus features a number of safety features to protect the system from overheating and user from potential hazards. It has a CPU control system with analog and digital inputs and outputs for easy integration into existing systems and applications. Moreover, the unit operates via an advanced multiple head robotic arm for greater accuracy and flexibility. Concept 3 Altus is ideal for advanced and demanding applications in the semiconductor production industry, offering efficient and uniform film deposition, advanced cleaning and safety capabilities, and advanced layer and process control. This reliable and highly versatile reactor is a great investment for factories and other production facilities.