Used NOVELLUS Concept 3 Altus #293758414 for sale

NOVELLUS Concept 3 Altus ("Altus") is a high-performance, next-generation plasma reactor developed by NOVELLUS Systems. Altus is capable of processing a wide range of materials, from thermal oxide to titanium nitride, with the highest process uniformity and highest throughput performance. The advanced design of the Altus utilizes novel technology to deliver repeatable, superior performance with the ability to process feature widths of 10 nanometers and below. At the core of Altus is its advanced gas delivery system, which offers a unique dual plasma source approach to provide a more uniform plasma across the full chamber width. Two magnetrons allow the plasma to extend further across the substrate, creating a strong magnetic cloud that offers a more uniform temperature over the entire substrate. The dual plasma source also offers enhanced flexibility for processing a variety of materials, including Thermal Oxide, Titanium Nitride, Carbon Nanotubes, Silicon Carbide, Gallium Nitride, and Aluminum Nitride. The Altus reactor utilizes a capacitively coupled radio-frequency (RF) power source with advanced pulsing technology. The technology utilizes a switchable power supply line to provide a more stable power delivery to the plasma source and subsequently allowing better control over the plasma parameters and minimization of damage to the substrate. At the same time, the RF power allows rapid temperature ramp up and cooling down of the process to control material processing conditions The Altus reactor is also equipped with advanced chamber and substrate geometry, which allows for superior step coverage and highly uniform process layers. The chamber geometry includes a long, wide-diameter baffled vessel that is designed to create a uniform heated gas distribution while maintaining the wafer-to-wafer uniformity required for modern cutting-edge applications. The substrate geometry also helps reduce substrate shadowing, refraction, and focusing effects that can lead to non-uniformity. The Altus system provides efficient and energy-efficient performance with reduced cycle times for sustained high throughput performance. By utilizing a greater range of parameters, the Altus system offers higher deposition rates, higher film quality, and better Throughput Rate-to-Duty Cycle (TRDC) ratios. The Altus is also designed to be easily upgradeable with newer technologies or process changes. This provides engineers and operators with the ability to keep up with cutting-edge technologies while keeping their current processes in place.