Used NOVELLUS Concept 3 Altus #293767143 for sale

NOVELLUS Concept 3 Altus is a high-performance, industrial-scale chemical reactor from NOVELLUS Systems. It is a flexible process solution for advanced film deposition applications in a variety of industries, such as semiconductor, flat panel display, and data storage. Concept 3 Altus performs thermal CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition), which are processes used to create precise, uniform thin films on multiple substrates. This reactor has a modular design, with a pre-assemblies equipment for improved installation and maintenance. A dynamic purge control can be adjusted for optimized performance. This reactor is equipped with several additional features to ensure optimal reliability and performance. The process inlet gas dryer is integrated, and this provides particle-free dry gas. VPS (Vacuum Pressure Switching) technology enables multizone processes. It also has a built-in fast loadlock system. NOVELLUS Concept 3 Altus reactor has a proprietary, low-maintenance heating unit. This utilizes an electric heat transport loop to reduce thermal stress on the substrate. It also has a special thermal profile machine that creates precise temperature zones precisely matched to the process requirements. Additionally, the advanced motor control technology ensures accurate, precise, and repeatable motion profiles. Concept 3 Altus is one of the most advanced industrial-scale chemical reactors in its class. It offers maximum throughput, reduced costs, and amazing performance, thus making it a highly competitive process solution for superior film deposition applications. Its advanced technologies and features ensure reliable and consistent processes every time.