Used NOVELLUS Concept 3 Altus #293767145 for sale

NOVELLUS Concept 3 Altus is a PECVD reactor that uses radio frequency plasma to deposit conformal thin films materials such as silicon carbide and aluminum oxynitride. The reactor is specifically designed for demanding conformal and directional higher-order process modules such as thin film handling, polishing, oxidation, and wiring. Featuring an improved design with an increased wafer load capacity, Concept 3 Altus offers excellent uniformity with minimal particle generation. The unit is built on a 100mm x 200mm substrate and includes an advanced ion source that produces fast-moving plasma with high deposition rates and low stresses. The advanced beam technology produces conformal coatings with excellent film uniformity that ensures the device being processed is covered uniformly. This ion source can be operated at lower temperatures, which helps reduce energy consumption and improve the overall lifetime of the unit. NOVELLUS Concept 3 Altus incorporates a unique dual displacement design that improves performance. The equipment features an upper chamber and a lower chamber that are connected by a dual-harness bridge. This design allows for greater loading capacity and better coverage of large substrates, and helps produce higher deposition rates and deposition uniformity. The reactor also has a sophisticated two-sided gas introduction system that produces a uniform and homogeneous gas flow over the substrate. This unit features independent gas gates located above and beneath the substrate and aids in producing higher deposition rates with low deposition stress. Concept 3 Altus also includes advanced automation features that improve its performance. It includes a user-friendly monitor panel that allows the user to conveniently monitor the machine's parameters and initiate commands from the monitor screen. The tool also allows for easy integration with other reactor systems, which helps simplify the production process and reduce operating costs. All in all, NOVELLUS Concept 3 Altus is a powerful PECVD reactor capable of producing a wide range of conformal thin films and depositions. It boasts a sophisticated design, excellent uniformity, improved loading capacity, and intelligent automation. These features make Concept 3 Altus an ideal choice for those looking for a reliable, efficient, and cost-effective PECVD reactor.