Used NOVELLUS Concept 3 Altus #9316137 for sale

NOVELLUS Concept 3 Altus Reactor is a high-performance, multi-functional deposition equipment used for dynamic film deposition in a variety of industrial applications. The reactor features an advanced non-line-of-site optical system designed to enable process stability, reliability, and repeatability of results. Concept 3 Altus Reactor consists of an ion source, plasma chamber, pre-clean chamber, and deposition chamber with a 10-stage, 4-zone heating unit. The wafer configurations are optimized to maximize thermal diffusion and minimize temperature gradients, ensuring process consistency and accuracy. The ion source is designed to generate energetic ions that are used to etch substrates and/or create plasma densities that cause the particles in the plasma chamber to interact with the substrate. This interaction forms thin films via vapor deposition processes that are used to coat materials. The plasma chamber is used to create and sustain plasmas at high temperatures which keep particles in the gas phase while they travel along a cylindrical path to the substrate. The pre-clean chamber is used to remove contaminants before deposition occurs, and the 10-stage, 4-zone heating machine is designed to ensure process stability and a uniform temperature. NOVELLUS Concept 3 Altus Reactor is engineered to ensure exceptional integration between the etch and deposition modules and automated control capabilities. It is capable of performing high-resolution etching, chemical vapor deposition, atomic layer deposition, and sputtering processes. Its advanced motion control systems facilitate simultaneous control of up to 16 independent wafer stages, which is essential for tight-tolerance process control and product uniformity. Concept 3 Altus Reactor is an ideal choice for a variety of industrial deposition processes. It offers high-performance capabilities, process stability, and reliable results with repeatable performance. Its advanced motion control systems and precise temperature regulation make it a cost-effective solution for any industrial film deposition application.