Used NOVELLUS Concept 3 Altus #9375599 for sale

NOVELLUS Concept 3 Altus
Manufacturer
NOVELLUS
Model
Concept 3 Altus
ID: 9375599
CVD System.
NOVELLUS Concept 3 Altus (C3A) is an industry-leading reactor designed for semiconductor manufacturing. The C3A offers unrivaled performance and versatility in controlled material properties and process parameters. The C3A has a large rectangular chamber that is capable of accommodating up to three thermal processes, which can involve several temperatures, pressures, flows, and other process conditions. Each of these processes can be independently controlled. The platform comes with a built-in interactive control equipment with an extensive range of automated functions, making it easy to setup and maintain accurate conditions in the chamber. The C3A also internally incorporates a twin-turret system, which enables multiple chemical vapor deposition (CVD) chambers to be used within the same unit. This allows for large process runs that go beyond what other systems of similar size can achieve. The C3A's features extend further with the implementation of Smart Chamber Sensing technology. This technology helps operators adjust the process conditions in real time by sensing and monitoring the conditions within the chamber. This results in a highly uniform coatings, giving a repeatability of ± 0.1µ over large areas. The C3A also comes with several safety features such as hot exhaust and pressure drop sensors, an implosive protection machine, and cooled thermal platforms that help small particles discharge away from the chamber. These safety features help protect the tool from any potential accidental damage. Overall, Concept 3 Altus is a revolutionary reactor asset that has no equal in terms of versatility and performance when it comes to delivering repeatable and uniform results in semiconductor production. With its wide range of process conditions, safety features, and Smart Chamber Sensing technology, the C3A is a cost-effective solution that can be tailored to your exact needs.
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