Used NOVELLUS Concept 3 Altus #9375600 for sale

NOVELLUS Concept 3 Altus is a mid-volume Chemical Vapor Deposition (CVD) reactor equipment used in semiconductor manufacturing for the deposition of silicon-based, epitaxial or polycrystalline films. Concept 3 Altus was developed to improve existing CVD reactor capabilities, with a focus on maximizing capability, flexibility, and throughput. The innovative features of the reactor system include its patented dual-chamber design, which optimizes the unit's throughput. The foundation of the machine's design is the patented Dual Chamber Technology (DCT), which employs a multi-zone layout topology. This arrangement allows for more efficient utilization of the reaction chamber space by two independently self-adjusting mini-chambers sharing the surface area within the main chamber. By partitioning off the reaction chamber, NOVELLUS Concept 3 Altus capitalizes on a number of valuable process capabilities, while reducing the number of process steps required. By combining the gas quenching and the reactive regeneration in a single reaction zone, many of the typical CVD reactor challenges such as non-uniformity and non-repeatability of the deposition processes are eliminated. Concept 3 Altus is equipped with a number of other features designed to maximize reactor and process performance. The tool is capable of performing advanced process steps such as high temperature vaporization and pre-sputtering for improved film uniformity and process repeatability. Additionally, the asset is equipped with a unique gas blending capability that enables two process gases to merge in a carefully regulated manner, further improving process accuracy and repeatability. The advanced capabilities of NOVELLUS Concept 3 Altus, combined with its robust design, allow it to provide exceptional performance and reliability in an industry standard CVD platform. By utilizing the patented Dynamic Chamber Technology, Concept 3 Altus delivers superior throughput and film uniformity when compared to conventional CVD systems. Additionally, the reactor model utilizes a number of advanced features such as gas blending, high temperature vaporization, and pre-sputtering to optimize the performance of the deposition process. Overall, NOVELLUS Concept 3 Altus is an innovative CVD equipment that delivers optimal performance, flexibility, and throughput.