Used NOVELLUS CONCEPT 3 INOVA-xT #9259673 for sale
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ID: 9259673
Wafer Size: 12"
Vintage: 2004
PVD System, 12"
Process: AL, TI(N)
Degas: Left and right
(2) Q300 AL
Q300 TIN
HCM TIN
HCM TAN
Cooler
EFEM / WTS-HV
EFEM:
Load port: (3) FOUPs
User interface location: Right with keyboard, mouse and monitor
User interface configuration: Clean room wall interface
(25) Wafers / FOUPs
BROOKS AUTOMATION Magnatran 7 ATM Robot
PEC Station
17-PEC Slots
Robot traverser
WTS-HV:
(2) Magnatran 7 Robots
Robot blades: Ceramic, dual
Cryo HUB
CTI-CRYOGENICS IS-8F (On-Board) Cryo pump
(6) VAT Isolation valves
Left and right load lock:
(2) PFEIFFER TMH 071P Turbo pumps
(2) VAT Isolation valves
Left and right degas:
(2) PFEIFFER TMU 521P Turbo pumps
(2) VAT Isolation valves
PFEIFFER / BALZERS TMH 071P Turbo pump
(2) Q300 AL and Q300 TIN:
On-Board Cryo pump
VARIAN V250 Turbo pump
On-Board Controller
Trust controller
MKS 649 Pressure controller
LPB
SIOC
ESC Pedestal
Mass flow controller: Ar, 200 SCCM
AERA FC-980C Mass flow controller: N2, 200 SCCM
AERA FC-980C UPC: 300 SCCM
INFICON Ion gauge
ANAFAZER Module
HCM TI and HCM TAN:
On-Board Cryo pump
VARIAN V250 Turbo pump
On-Board Controller
Trust controller
MKS 649 Pressure controller
LPB
SIOC
ESC Pedestal
Mass flow controller: Ar, 200 SCCM
MKS Mass flow controller: N2, 200 SCCM
AERA FC-980C UPC: 300 SCCM
AERA FC-980C Ion gauge
Anafazer Module
Miscellaneous parts:
AFFINITY EWA-23DK-HE04CBC Chiller
(3) POLYCOLD 1XCL Chillers
(4) CTI 9600 Compressors
Vacuum jacket lines
Cable box
Shield box
Spare parts
Desktop PC
MPD (WTS-HV)
General rack:
(2) ADVANCED ENERGY RFG 1251 RF Generators, P/N: 27-156759-00 / 3155107-101
Electric cabinet rack (Q300 AL):
TREK 684-1 ESC Power supply
CPI CPW2870B10 DC Power supply
Electric cabinet rack (Q300 TIN):
CPI CPW2870B10 DC Power supply
(2) Electric cabinet racks (HCM):
TREK 684 ESC Power supply
CPI CPW2870B10 DC Power supplies
(8) SORENSEN DLM 60-10 EM Coil power supplies
Missing parts:
BROOKS AUTOMATION Magnatran 7 Robot
2004 vintage.
NOVELLUS Concept 3 Inova XT is an innovative reactor designed to extend the limits of logical scaling technology. The reactor uses an Intra-die etch process to control the shape, size, and profile of features on semiconductor wafers. The Inova XT reactor is ideal for micro patterning applications when precision and accuracy are needed. The Inova XT reactor utilizes a unique, patented flux cavity design, which enables it to achieve precision etching with a high degree of accuracy. The reactor comprises of a plasma source, which is integrated with a course and fine nozzle equipment that can be controlled by a single operator. This system is capable of producing well-defined etch profiles, while maintaining a tightly controlled etch rate. The Inova XT reactor is tailored to meet the increasingly stringent requirements of advanced processes. The reactor features a built-in bath etch unit which proactively removes every last droplets and contaminates. Eliminating the messiness associated with other reactors. This machine also helps prevent contamination and promotes superior wafer-to-wafer repeatability. The Inova XT is also capable of simultaneous etching, as well as staggered etching. Staggered etching allows operators to minimize corner rounding and improve throughput of small feature sizes. The reactor's Flex-Etch technology also allows for custom recipe creation for specific applications. This allows the user to tailor the etching process to meet the demands of their specific process or substrate. The Inova XT also boasts the design of being a cost-effective solution. Its unique architecture provides a significant reduction in the number of parts and pumps typically needed for other reactors. This reduces operational expenses and energy consumption. In addition, the reactor also includes a built-in adaptive flexibility to reduce the amount of time needed to switch between processes. Concept 3 Inova XT is an incredible etch reactor that offers the precision of lapped wafers with the efficiency of etched features. With its patented flux cavity design and built-in bath etch tool, the Inova XT reactor is a cost-effective solution that can help semiconductor manufacturers achieve pin-point accuracy, superior repeatability, and increased throughput with reduced energy costs.
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