Used NOVELLUS CONCEPT 3 INOVA-xT #9314932 for sale

NOVELLUS Concept 3 Inova XT is a state-of-the-art reactor designed for use in the fabrication of integrated circuits. This reactor allows for superior thin film deposition by using advanced, high-temperature processes such as chemical vapor deposition (CVD), atomic layer deposition (ALD), and physical vapor deposition (PVD). It is capable of depositing a wide range of materials, including copper, titanium, aluminum, and silicon oxides, so that it can be used in the creation of a number of different components. This reactor is made up of three primary components: the plasma source, the main chamber, and the exhaust tower. The plasma source directs a source of high-energy molecules which cause ionization of the gas atoms in the process chamber. This allows for a reaction with the material being processed. The main chamber holds the material being processed and controls the temperature and pressure of the equipment. The exhaust tower helps to keep contaminant particles away from the reaction and any material being processed. Concept 3 Inova XT is capable of extremely precise processes with excellent repeatability. Its multi-zone control helps achieve a uniform deposition without creating any contamination issues across the work piece. It can be programmed for a variety of process parameters which enable the selection of the optimum process settings for maximum thin film performance. The main chamber of this reactor has high-temperature insulation to provide excellent thermal efficiency as well as thermal uniformity across the chamber. This helps to ensure that the temperature remains within optimal operating parameters. The chamber is also equipped with an automated following system which allows for precise control of the position of the gases and the target materials in the chamber during processing. This allows for optimized process repeatability. Additionally, NOVELLUS Concept 3 Inova XT is equipped with a real-time monitoring unit which allows for closed-loop process control. Overall, Concept 3 Inova XT is a highly advanced reactor machine which offers superior thin-film deposition capabilities for both the copper integration process and a number of other related processes. Its high-temperature, multi-zone control provides uniform deposition and excellent thermal efficiency throughout the process. It is also capable of monitoring the entire process in real-time which allows for optimized process repeatability and enables the selection of the optimum settings for maximum thin film process performance.