Used NOVELLUS Concept 3 Inova #293638672 for sale

NOVELLUS Concept 3 Inova is a multi-tool, six-chamber semiconductor reactor designed for advanced etch, deposition, implant and annealing processes for three-dimensional integrated circuits. It combines the flexibility of extensive process capabilities with a large chamber design capable of 6kW power delivery. Concept 3 Inova features a patented drift compensation chamber geometry, designed to deliver both plasma uniformity and power density that are simultaneously optimized for the best results of high-throughput and high-yield processes. The module has several scanning modes allowing the user to customize the process cavity to achieve the best results. NOVELLUS Concept 3 Inova can support single wafer and wafer to wafer cluster configurations. It has a horizontal load-lock capable of holding up to 13 and 28 uniform 200mm or 300mm wafers respectively, allowing it to achieve high productivity and efficiency. The load-lock also uses a pin-recovery technology, which reduces any static charge built up during transfer, in order to minimize radiation-induced particle effects. The etch processes for Concept 3 Inova include wet, dry, and plasma etch processes. The dry etch systems can provide high selectivity rates, with different configurations to suit a wide range of materials, feature size, and process layers. The wet etch processes offer additional flexibility and low cost benefits, but require additional process control in order to achieve high precision results. The plasma etch system offers very high throughput and is particularly suitable for large volumes. FECVD and PECVD systems are also included with NOVELLUS Concept 3 Inova. The former provides robust deposition capabilities with low electrical power consumption, while the latter offers standard process options for most materials, such as Silicon PECVD, Nitride PECVD, and Oxide PECVD. Concept 3 Inova also includes crystal-degree systems and anneal systems that can be configured to meet a range of process requirements from low-temperature annealing to high-temperature annealing. It also offers implant capability with a range of configurable beam energies and implant geometry settings for the best achievable sacrificial wafer quality. In order to facilitate continuous process monitoring, NOVELLUS Concept 3 Inova includes an on-board diagnostics system. This includes a range of sensors to measure all critical parameters, as well as sophisticated tracking and feedback controls. It also includes a variety of in-situ gas analysis options, allowing users to detect and analyze potentially damaging particles during a process cycle.