Used NOVELLUS Concept 3 Inova #293638673 for sale

NOVELLUS Concept 3 Inova is a crystalline chemical vapour deposition (CVD) reactor used for the deposition of chemical species on a substrate. The deposition process is typically carried out in a vacuum chamber and is ideal for creating a variety of semiconductor and related materials. The Goal of Concept 3 Inova CVD reactor is to enable the deposition of high quality materials with a low defect density and uniform deposition at relatively low temperatures. The Inova has a two source two showerhead modular design, with automatic inlets and outlets, thus achieving a higher throughput than traditional reactors. Its flexible modular design allows for both vertical and horizontal wafer orientations, as well as a variety of gas delivery and exhaust systems. With its innovative design, the Inova is capable of running a variety of process integration recipes. The CVD reactor utilizes a variety of process gases and has an excellent temperature control range that can be adjusted to maximize the quality of the deposited material. NOVELLUS Concept 3 Inova is suitable for process optimization as it is equipped with a quartz inlet window, an advanced heating system, and other specialized hardware that ensures an optimal temperature range and uniformity for a given process, eliminating the need for further process adjustments. Additionally, its multiple electrode design, automatic loading and unloading, and automated features make it possible to tailor process recipes to a customer's needs. The Inova CVD reactor is designed for large area / small area deposition and conformal deposition of materials for a variety of optoelectronic, nanofabrication, and MEMS applications. With advanced features such as high temperature capability, real-time endpoint detection and quality control, the Inova is an ideal choice for customers that require high-performance CVD reactors. The system is equipped with a Direct Drive Showerhead, allowing for precise process control and fast response times. It is also fully in-situ cleaning capable, enabling superior film quality and deposition uniformity control. Overall, Concept 3 Inova is a state of the art CVD reactor system that provides superior deposition performance and excellent quality control capabilities. The reactor is extremely versatile and offers great flexibility, making it an ideal solution for a variety of semiconductor and advanced material deposition applications.