Used NOVELLUS Concept 3 Inova #9281509 for sale

NOVELLUS Concept 3 Inova is a plasma-enabled chemical vapor deposition (CVD) tool that is designed for high-profile, in-situ plasma-assisted deposition of thin film layers on various substrates. It is specifically developed for advanced thin-film deposition process on a wide range of substrates without requiring any additional post-deposition treatment steps. Concept 3 Inova is equipped with a patented "ZoneLock" technology that offers temperature precision and control for wide-ranging, process-profiling capabilities across multiple wafers. The CVD reactor consists of three different chambers: an introduction chamber, a process chamber, and a disposal chamber. The introduction chamber is used to pre-condition substrates, while the process chamber is the main processing area, where the materials are exposed to high temperature reactors and process gas. The disposal chamber is used to safely dispose of unreacted reactants, fumes, and byproduct gases. The dynamic reaction environment of NOVELLUS Concept 3 Inova is created by a unique "plasma zone" technology. This is an ultra-active gasification zone in which the substrates and reactants are bathed in a high-energy plasma field that enables precise reaction and deposition of materials. The reactive gasifications, such as fluorine and oxygen, are created and controlled through highly regulated, yet dynamic, supersonic jets. Advanced plasma-zone control technologies also enable superior doping control and uniform deposition over complex feature geometries. Concept 3 Inova also has a special rotary design that further enhances uniformity across layers. The rotary design offers a wide range of substrate sizes and can support wafers up to 300 mm (12 inch) in diameter. The entire system is encased in an environmental chamber that is designed for exacting precision and control throughout the deposition cycle. NOVELLUS Concept 3 Inova CVD system brings together several state-of-the-art technologies to provide a world-class deposition with superior uniformity and process control. This CVD reactor expands the capabilities of NOVELLUS family of products and offers users a cost-effective, reliable process enabling advanced device fabrication. It is ideal for accurate deposition applications on various substrates, such as superconducting semiconductor materials, precision optics, and microelectromechanical systems (MEMS).