Used NOVELLUS Concept 3 Speed Max #9167157 for sale

NOVELLUS Concept III Speed Max is a high-performance vertical chemical vapor deposition (CVD) reactor designed for the deposition of thin films in the semiconductor industry. It is a high productivity, scalably expandable, and configurable platform. The reactor is capable of a wide range of deposition processes from metal to polycrystalline silicon, and is capable of performing at an industry-leading deposition rate. NOVELLUS Concept III Speed Max is designed with the user in mind. The platform is easy to configure, maintain, and operate in a wide variety of operating conditions. It features a fully automated chamber, adjustable gas flows and pressures, and a kinematic linkage that enables highly precise and repeatable process parameters. The chamber also features a flow-through gas delivery system, which helps eliminate manual valve maintenance. NOVELLUS Concept III Speed Max provides users with the capability of depositing up to five different materials simultaneously with high throughput and high selectivity. The chamber has also been designed to be able to deposit uniform thickness films at high throughput rates. In addition, the reactor features an adjustable substrate holder that can be adjusted to fit different wafer sizes, and includes an adjustable reaction zone that is precisely tuned for each material to ensure the chamber runs in peak performance. NOVELLUS Concept III Speed Max is a versatile platform offering advanced CVD deposition for a wide variety of applications. It comes with a suite of performance and safety features that make it a superior choice for thin-film deposition. The reactor also offers one of the highest throughput rates in the industry, providing users with faster cycle times to enable them to reach their process goals faster. In addition, NOVELLUS Concept III Speed Max offers users the ability to configure the chamber to offer customized deposition recipes and parameters tailored to their specific application requirements. Overall, NOVELLUS Concept III Speed Max reactor is a high-performance, versatile, and configurable deposition platform that is well suited for a variety of thin-film deposition applications. It offers a wide range of process capabilities and is capable of achieving high throughput and selectivity for multiple materials.