Used NOVELLUS Concept 3 Speed Max #9195754 for sale

NOVELLUS Concept 3 Speed Max is a type of reactor typically seen in semiconductor foundries and is highly advanced, capable of producing extremely accurate processes in the fabrication of semiconductor components. Concept 3 Speed Max reactor is designed to create very high quality layers of thin films with a high degree of accuracy and precision. The reactor is designed to be very efficient in the production of deposited layers, utilizing a PVD process to deposit a range of different materials, including metals and compounds, onto a substrate. It has a range of chambers which can be used depending on the size and material of the substrate being processed, for example a small chamber for smaller substrates or a high power chamber for larger substrates. The process of creating a thin film with NOVELLUS Concept 3 Speed Max reactor is achieved through a series of steps, usually starting with the introduction of a gas source, such as a vapor source, into the deposition chamber. This gas is then heated and pressurized in accordance with the material that is going to be deposited and then sent to the source chamber in the deposition chamber. In the deposition chamber, the molecules of the gaseous material collide with the substrate and cause the deposition of the material onto the surface. The material is then heated by a high powered ion beam, usually an ionized argon beam, which helps fuse the particles together and provides a uniform layer of opacity. The substrate is then exposed to a UV light source to further activate the ions and complete the deposition process. The high speed of Concept 3 Speed Max allows for extremely accurate layer deposition, which results in very consistent layers of film produced. The reactor is also very chemically stable, and is able to process materials which require more complex chemical processes. Additionally, the reactor uses advanced technologies such as laser patterning and image recognition which assists with the precision of the deposited film. Overall, NOVELLUS Concept 3 Speed Max is a highly advanced reactor which provides excellent control over the deposition of thin films. It is capable of achieving very consistent results with great accuracy and precision. With its efficiency and wide range of applications, Concept 3 Speed Max is a great choice for the fabrication of semiconductor components.