Used NOVELLUS Concept 3 Speed Max #9259681 for sale
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ID: 9259681
CVD System, 12"
Wafer type: Notch
Signal tower
PEC Module
Foop: BROOKS AUTOMATION
Foop type: 3-Port
BROOKS Magnatran 7 TM Robot
TM Robot blade: Ceramic
Load lock convectron: 275 min
L/L Baratron: MKS
TM Baratron: MKS
L/L Slit valve type: VAT
Module slit valve type: SMC
PFEIFFER TM Turbo pump
MKS TM Throttle valve
VAT TM Line valve
BROOKS AUTOMATION ATM Robot
ATM Robot blade: Arm metal
AWC Sensor
UI Type: LCD
EMO's: Push button
Host interface: SECS
Chaser: CRT Monitor
IOC Version: 4.72
SSD Type: C3-PDRS
(3) SMC XGT300-30-1A-X2 TM Value, P/N: 60-251903-00
Load lock value: VAT 03012-LA24-0001/0503, A-62591
Chamber A, B and C:
Chamber type: Speed max
Chamber process: ILD
ESC Type: Notch
Manometer (10T): MKS
Manometer (30T): MKS
Manometer (100m): MKS
Throttle valve: NC TBV-IQA-200-NW-50
Dual pedestal lift
LEYBOLD MAG200CT Turbo pump
ESC / Dome Cooling
Dual clean injector kit: Single RPC
Process clean type: RPC
Temperature monitoring: Dome monitor 201
ADVANCED ENERGY 10013 Navigator RF Match
VERITY EPD, P/N: 1005972
Black shield
MOOG SMART Motor
No module dry pump
Chamber A:
Type / Make / Model / Gases / Size
MFC / BROOKS AUTOMATION / SLA 7950S / O2 / 500 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / NF3 / 5 SLM
MFC / BROOKS AUTOMATION / SLA 7950S / H2/CF: 0.727 / 1.5 SLPM
MFC / BROOKS AUTOMATION / SLA 7950S / Ar / 3000 SCCM
MFC / HORIBA / Stec (Z500, SEC-Z512MGX) / N2 / 300 SCCM
MFC / HORIBA / Stec (Z500, SEC-Z512MGX) / SiH4 / 200 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / Ar / 500 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / HE / 1000 SCCM
Chamber B:
Type / Make / Model / Gases / Size
MFC / BROOKS AUTOMATION / SLA 7950S / O2 / 500 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / NF3 / 5 SLM
MFC / BROOKS AUTOMATION / SLA 7950S / H2 / 1500 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / Ar / 3 SLPM
MFC / BROOKS AUTOMATION / SLA 7950S / SiH4 / 100 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / SiH4 / 200 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / Ar / 500 SCCM
UPC / BROOKS AUTOMATION / SLA 7950S / HE / 1000 SCCM
Chamber C:
Type / Make / Model / Gases / Size
MFC / BROOKS AUTOMATION / SLA 7950S / O2 / 500 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / NF3 / 0.5 SLPM
MFC / BROOKS AUTOMATION / SLA 7950S / H2 / 1500 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / Ar / 3000 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / SiH4 / 100 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / SiH4 / 200 SCCM
MFC / BROOKS AUTOMATION / SLA 7950S / Ar / 500 SCCM
UPC / BROOKS AUTOMATION / SLA 7950S / HE / 1000 SCCM
Missing parts:
MC3 Controller: MKS AX7670-21 3L Remote Plasma Source (RPS)
NTM Delta controller
PDX 5000 / PDX 8000 / Apex 10K Generators
Turbo pump controllers
Missing parts for chamber A, B and C:
Apex 10013 HF Generator
PDX 8000 MF Generator
PDX 5000 LF Generator
NTM
Uninterruptable Power Supply (UPS): 208 V, 50/60 Hz, 4-Wires
Power supply: 208 V, 50/60 Hz, 5-Wires
2007 vintage.
NOVELLUS Concept 3 Speed Max is an advanced chemical vapor deposition (CVD) reactor designed with improved material films formation and process time reduction capabilities. It has been mainly developed for use in the semiconductor industry, particularly for the deposition of dielectrics and metals. The Speed Max reactor consists of a reaction chamber, a process gas delivery equipment, control system, and heating unit. The reaction chamber is a glass enclosed stainless steel vessel equipped with automated accessories to ensure accurate deposition rates. The process gas delivery machine enables the control and regulation of gas pressures, temperatures, and humidity. The heating tool is powerful and designed to sustain an even temperature throughout the chamber. The reactor is also equipped with an advanced control asset which enables the accurate manipulation of process parameters such as the process pressure, temperature, gas flow, as well as the deposition rates. The real-time monitoring of the chamber conditions, including the temperature, pressure, and gas flow, are also possible via this model. The Speed Max also features a unique batch-style deposition which is designed to minimize material deposition time. The reactor can be pre-programmed to deposit films in predetermined batches, enabling faster, automated production. Furthermore, the equipment can be configured with multiple substrate holders to further speed up the process. The reactor has also been designed to offer superior process repeatability, which is essential to ensure satisfactory film formation. Furthermore, the system's advanced software ensures repeatable process results regardless of the environmental conditions. Lastly, the software also helps in diagnosing and optimizing any potential process issues. Concept 3 Speed Max is a powerful and highly advanced reactor and a must-have for semiconductor manufacturers. It promises the most precise and quick deposition process with repeatable results. The Speed Max now offers a competitive edge to those in the industry who are looking for the most up-to-date deposition methodologies.
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