Used NOVELLUS Concept 3 Speed Max #9281511 for sale

NOVELLUS Concept 3 Speed Max is a next-generation advanced plasma reactor, designed for advanced semiconductor device fabrication processes. It utilizes advanced technology to provide high uniformity and high throughput capabilities to meet the stringent requirements of advanced device fabrication. Concept 3 Speed Max utilizes the latest advances in low-pressure plasma deposition (LPD) technology to deliver high process yields and repeatability. The advanced design and engineering of NOVELLUS Concept 3 Speed Max enable improved uniformity of the deposited film across the entire substrate. Concept 3 Speed Max utilizes variable ionized source technology to control the deposition process, allowing for a higher degree of uniformity and more efficient processes. Additionally, NOVELLUS Concept 3 Speed Max incorporates a high-speed plasma generator, enabling more efficient processes with higher throughputs. The design also enables the equipment to accurately scan and adjust to varying substrate heights and surface topologies to minimize shadowing. The high-speed scanner allows for faster scanning of the entire substrate during the deposition phase, increasing throughput and uniformity. The end-result is an increased device production rate. In addition, the gas distribution system in Concept 3 Speed Max ensures precise control over the deposition process, providing uniform surface properties across the entire substrate. NOVELLUS Concept 3 Speed Max's advanced in-situ monitoring capabilities further ensure precise process control. The advanced monitoring unit incorporates an onboard camera with an integrated microscope to observe the substrate surface during the entire deposition process. This monitoring machine provides detailed process information and the ability to detect any process issues during the manufacturing stage, minimizing process variability and optimizing process yields. Concept 3 Speed Max also incorporates a robust cleaning and substrate preparation process with automatic wafer gripper technology for enhanced substrate probe placement. This multiple-station adaptive robot ensures accurate probe placement and ensures consistent wafer singulation. The advanced process control includes a comprehensive library of chemical recipes and on-board real-time correction and evaluation for reduced substrate-to-substrate variation. Additionally, the advanced process control ensures uniform film thickness across the entire wafer. NOVELLUS Concept 3 Speed Max is a state-of-the-art advanced plasma reactor, designed to improve process yields and uniformity while increasing throughput capabilities. The advanced technologies used in the tool, including variable ionized source, high-speed plasma generator, advanced in-situ monitoring, advanced process control, and automated wafer gripper technology, provide an optimal solution for advanced device fabrication.