Used NOVELLUS Concept 3 Speed Max #9389741 for sale

NOVELLUS Concept 3 Speed Max is an innovative piece of equipment used in the fabrication of integrated circuits composed of thin-film materials. This reactor is designed to provide the highest degree of performance and reliability in layers of metal oxide semiconductor (MOS) circuits with extremely thin layers for applications such as ultra-low leakage, embedded memory, and other high-performance components. Concept 3 Speed Max has three separate modules that can operate independently or in combination. The three modules are an RIE (Reactive Ion Etch) module, a CVD (Chemical Vapor Deposition) module, and a PECVD (Plasma Enhanced CVD) module. The RIE module is for etching layers of metal oxide in desired shapes and patterns, to create specific thin-film features used in the fabrication of circuits. The CVD module is for depositing various types of thin-film materials in layers to create smooth surfaces, illustrate patterns, and control the thickness of the materials. The PECVD module is used for fast etching and deposition of thin-film materials, as well as for patterning. NOVELLUS Concept 3 Speed Max features advanced process control and monitoring systems that enable users to optimize their process parameters, allow for better repeatability, and reduce the amount of time needed for process development. It also has a radio frequency (RF) plasma generator that allows users to simultaneously process various levels of interlayer dielectrics (ILD). The plasma generator provides improved speed and accuracy in etching and deposition processes. Concept 3 Speed Max is the only equipment capable of delivering ultra-low leakage performance with maximum thin-film layers. It is ideal for production of high-performance circuits, and it has repeatability of 2 sigma over the production run. It is made of high-quality materials and has a long life-span. Its energy and resources are optimally managed to minimize the environmental impact associated with its operation. NOVELLUS Concept 3 Speed Max is the only etch and deposition system that can combine etch and deposition processes with ultra-low leakage performance in the production of MOS circuit layers. It provides high-quality performance and reliability, and cost-saving advantages for production of high-performance components. With its advanced process control and monitoring systems, users can maximize the efficiency of this innovative reactor while minimizing its environmental footprint.