Used NOVELLUS Concept 3 Speed NEXT #9170857 for sale

NOVELLUS Concept 3 Speed NEXT is a reactor designed for advanced thin-film deposition applications. This reactor features advanced technology that allows for precise control over thin-film growth and conformal coating. Concept 3 Speed NEXT reactor offers three separate deposition zones to serve a variety of needs and flexible configurations. The first of its three deposition zones featured on the reactor is the primary deposition zone. It is a low powered zone with customizable metal deposition recipes and conformal coatings. The primary deposition zone includes a unique combination of process steps that allow for precise control while optimizing film thickness uniformity and step coverage. It is capable of Pico/Nano-scaling deposition and can deposit/etch barrier and adhesion layers, source layers and complex metallic structures. The second deposition zone, the surface treatment zone, provides real-time surface modifications and adhesion layers to enhance film growth properties. The area features reactive ion etching, full surface treatments, selective surface treatments and pre-deposition surface treatments. It is designed to achieve superior results while maintaining conformal coating characteristics. The third and last of the deposition zones featured on NOVELLUS Concept 3 Speed NEXT is the high deposition zone. This deposition zone offers the much needed high deposition rate, which allows for the most demanding deposition requirements. The high deposition rate zone is designed to deposit thick films and offer consistent and reliable uniformity and step coverage. Concept 3 Speed NEXT reactor is capable of handling a variety of thin-film deposition applications, from automotive components to semiconductors, flat panel displays, optoelectronics, MEMS, as well as medical, aerospace and energy applications. The reactor provides an integrated thin film architecture with superior process control and uniformity capabilities to maximize throughput and performance. It is the ideal solution for those looking for advanced thin-film deposition applications.