Used NOVELLUS Concept 3 Speed NEXT #9235680 for sale

NOVELLUS Concept 3 Speed NEXT is a chemical vapor deposition (CVD) equipment specifically designed for advanced semiconductor applications. It provides the ultimate high-throughput solution for polysilicon, silicon oxide, and other applications. Concept 3 Speed NEXT reactor integrates NOVELLUS latest advanced technologies, including patented blade cassette delivery, robotics automation, and multiple temperature zone capabilities. Its innovative design ensures superior fabrication quality and cost-efficiency. NOVELLUS Concept 3 Speed NEXT includes a low-pressure three-speed chamber, preheat chamber, and gas box with 4-way valve. The low-pressure chamber is equipped with high-quality heating and cooling elements, ultra-low thermal drift, and low-pressure control. A metal-lined port allows for quick substrate loading and unloading. The preheat chamber provides additional temperature control to ensure the highest deposition rates. The system offers precise temperature control via a multi-zone heated/cooled chuck and heated/cooled walls. It is designed to provide precise control of film thickness, grain size, and process uniformity. It also offers a low-pressure delivery of precursor gases, including silane, sulfur hexafluoride, and helium. The 4-way valve at the center of the unit allows for fast and accurate precursor delivery and fast reaction time. Concept 3 Speed NEXT also features a host of advanced data systems designed to achieve maximum throughput. Its fast and reliable robotic arm ensures that wafers are positioned quickly and efficiently. Its high level of automation allows for quick and easy programming of recipes to make deposits in milliseconds. Overall, NOVELLUS Concept 3 Speed NEXT is an extremely advanced reactor machine designed to meet the demands of the most advanced semiconductor applications. It offers unparalleled precision, speed, and process uniformity, making it the perfect choice for today's manufacturers.