Used NOVELLUS Concept 3 Speed NEXT #9294439 for sale

NOVELLUS Concept 3 Speed NEXT is a high speed, precision-engineered reactor for the deposition of metal and other thin film materials. The equipment is designed for use in the semiconductor, MEMS, and solar cell industries, and is capable of delivering advanced metrics for the most demanding applications. Concept 3 Speed NEXT is based on a low-temperature, inductively coupled plasma (ICP) source, which features a low pressure hydrogen-based plasma generator that enables deposition of a range of metal elements. This system operates between 0.6 and 0.7 mTorr, allowing for superior process control and flexibility. Additionally, the ICP source increases process uniformity due to its Gaussian shaped plasma flux, which reduces the possibility of non-uniformities. NOVELLUS Concept 3 Speed NEXT features a compact, modular design to allow for flexibility when working with a variety of product sizes. The unit features a gas distribution machine that balances the ratio of precursors to maintain a uniform film growth rate. The tool's automated center locating feature corrects any misalignment that can occur due to slight product motion during production. Concept 3 Speed NEXT has the capability to process with high film step coverage across various product structures due to its "direct injection" deposition technology, which coats on a broader scale with a single injection source. This makes it possible to shape discrete metal layers with complex geometries. The concept incorporates a superior wafer-size repeatability asset for optimal wafer-to-wafer repeat accuracy up to 100 25-micron nominal diameters. NOVELLUS Concept 3 Speed NEXT is built with state-of-the-art safety and control features. Its nitrogen-shielded vessels and intelligent operator safety features protect personnel from any hazardous process materials. The model is also designed to minimize process downtime due to its advanced maintenance monitoring and diagnostics capabilities. This advanced technology provides the ultimate in speed and precision. High quality results and superior layer uniformity are attainable because of Concept 3 Speed NEXT's advanced deposition controls. The equipment is designed to deliver a reliable and accurate deposition process to maximize yield and throughput while keeping costs low. NOVELLUS Concept 3 Speed NEXT is the perfect solution for any demanding thin-film coating application.